Samsung Electronics Co., Ltd.

Hyun-Su Jun

In-Joong Kim

Ki-Sang Kim

Jong-Bum Kim

Min-Woung Choi

Seung-Heong Lee

Plasma processing methods of a semiconductor manufacturing apparatus which can minimize the amount of impurities adhered to the surface of a wafer, when a desired process using plasma is performed. According to the plasma processing methods of the semiconductor manufacturing apparatus, after the desired process is completed, the plasma generated over the wafer is diffused, and then the wafer is de-chucked.

Plasma processing method of semiconductor manufacturing apparatus

An image data test unit includes a data acquisition unit configured to acquire image data having individual frames, an image data temporary storage unit configured to receive the acquired image data from the data acquisition unit to store a certain amount of the image data, and a test calculation unit configured to sequentially receive the image data from the image data temporary storage unit to store a certain amount of the image data, and compare the stored image data with pre-set test elements. In addition, an image apparatus having the image data test unit and a method of testing image data using the image data test unit are also provided.

Growing community of inventors

Seongnam-si, South Korea

Hyun-Su Jun