Korea Kumho Petrochemical Co., Ltd.

Hyun Sang Joo

Dae Kyung Yoon

Joon Hee Han

Jung-Hoon Oh

Dong Chul Seo

Jin Ho Kim

Dae Hyeon Shin

Tae Gon Kim

Hyun Soon Lim

Sung Jae Lee

Kyoung Jin Ryu

A resist additive represented by Formula 1 below and a resist composition including the additive are disclosed. The resist additive improves hydrophobicity of the surface of the resist film to prevent materials from being leached in water during exposure of immersion lithography and is converted to have hydrophilicity by deprotection reaction during development. As a result, a micropattern of a resist film with excellent sensitivity and high resolution is formed.  In Formula 1, the substituents are defined as described in the specification.

Additive for resist and resist composition comprising same

Disclosed are a hydrophilic photoacid generator prepared by copolymerization of a first (meth)acrylic acid ester having a structure represented by the following Formula 1 or 2, with a polymerizable monomer selected from the group consisting of a second (meth)acrylic acid ester, an olefin-based compound and a mixture thereof, each of which contains a functional group selected from the group consisting of a hydroxyl group, a carboxyl group, a lactone group, a nitrile group and a halogen group: 

Hydrophilic photoacid generator and resist composition comprising same

A sulfonium compound represented by formula (1), a photo-acid generator, and a method for producing a sulfonium compound are provided: wherein X represents an electron-donating group; Rand Reach represent an alkyl group, a cycloalkyl group, or the like; Rand Reach represent an arylene group or a heteroarylene group; Rand Reach represent an alkyl group, a cycloalkyl group, or the like; and Aand Bare anions that are different from each other. The sulfonium compound, when used as a photo-acid generator, can produce a uniform and excellent resist pattern.

Sulfonium compound, photo-acid generator, and method for manufacturing the same

Provided is a copolymer. The copolymer, when incorporated into a resist composition, can provide a satisfactory resist pattern with high sensitivity, high resolution, high etching resistance and a reduced amount of outgas.

Polymer, method for producing the same, and resist composition containing the same

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Daejeon, South Korea

Hyun Sang Joo