Samsung Electronics Co., Ltd.

Hyun-Jun Bae

Dong-won Kim

Min-sang Kim

Ji-myoung Lee

Keun-Hwi Cho

Jun Ho Seo

Weonwi Jang

Sung-Min Kim

Jun Hyuk Seo

Yong-Hyun Kwon

Jun Seon Seo

Weon-Wi Jang

Keun-hwl Cho

A method of fabricating a semiconductor device is provided. A sacrificial gate, a hard mask, a spacer and a first interlayer insulating film are formed on a substrate. The hard mask, a part of the spacer, and a part of the first interlayer insulating film are removed to expose an upper portion of the sacrificial gate. A sacrificial insulating layer covers the exposed upper portion of the sacrificial gate. A second interlayer insulating film covers the sacrificial insulating layer, the spacer and the first interlayer insulating film. The sacrificial insulating layer and the second interlayer insulating film are partially removed to expose a top surface of the sacrificial gate. The sacrificial gate and the sacrificial insulating layer are removed to form a trench. A gate structure is formed in the trench.

Semiconductor device and method of fabricating the same

A memory device includes a memory cell that includes a storage node, a first electrode, and a second electrode, the storage node stores an electrical charge, and the first electrode moves to connect to the storage node when the second electrode is energized.

Switch and method of forming the same

A memory device includes a storage node, a first electrode, and a second electrode formed in a memory cell, the storage node stores electrical charges, the first electrode comprising a first portion electrically connected to a second portion, the first portion moves to connect to the storage node when the second electrode is energized.

Electromechanical switch and method of forming the same

A semiconductor device having a bar type active pattern and a method of manufacturing the same are provided. The semiconductor device may include a semiconductor substrate having a semiconductor fin configured to protrude from a surface of the semiconductor substrate in a first direction, the semiconductor substrate having a first width and a second width crossing the first width, wherein the first width and the second width extend in a second direction. A plurality of active patterns may be arranged in the first direction with a separation gap from the semiconductor fin. A plurality of support patterns may be arranged between the semiconductor fin and one of the plurality of active patterns arranged closer to the semiconductor fin in the first direction, and between the plurality of active patterns arranged in the first direction to support the plurality of active patterns. A gate may be arranged to cross the plurality of active patterns in the second direction and to cover a portion of the at least one of the plurality of active patterns.

Semiconductor device having bar type active pattern

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Suwon-si, South Korea

Hyun-Jun Bae