Lg Innotek Co., Ltd.

Hyun Joon Jung

Duck Hoon Park

Jee Heum Paik

Woo Young Chang

Hae Sik Kim

In an alloy metal plate according to an embodiment, diffraction intensity of a (111) plane of the alloy metal plate is defined as I (111), diffraction intensity of a (200) plane of the alloy metal plate is defined as I (200), diffraction intensity of a (220) plane of the alloy metal plate is defined as I (220), a diffraction intensity ratio of I (200) is defined by the following Equation 1, and a diffraction intensity ratio of I (220) is defined by the following Equation 2. At this time, the A is 0.5 to 0.6, the B is 0.3 to 0.5, and the value A may be larger than a value B. The diffraction intensity ratio of I (220) is defined by the following Equation 2. In addition, in an iron (Fe)-nickel (Ni) alloy metal plate of a deposition mask for OLED pixel deposition according to an embodiment, the metal plate is formed of a plurality of crystal grains, and the maximum area of the crystal grains measured over the entire area of the metal plate is 700 μmor less.

Alloy metal plate and deposition mask including alloy metal plate

A display substrate according to the embodiment includes a base material containing chromium and iron, wherein the base material includes a surface portion and a central portion, the surface portion is defined as a depth region from a surface of the base material to a depth of 5 nm in a thickness direction of the base material, and a ratio of chromium atoms to iron atoms (Cr/Fe) of the surface portion is greater than that of the central portion.

Substrate for display

In an alloy metal plate according to an embodiment, diffraction intensity of a (111) plane of the alloy metal plate is defined as I (111), diffraction intensity of a (200) plane of the alloy metal plate is defined as I (200), diffraction intensity of a (220) plane of the alloy metal plate is defined as I (220), a diffraction intensity ratio of I (200) is defined by the following Equation 1, and a diffraction intensity ratio of I (220) is defined by the following Equation 2. At this time, the A is 0.5 to 0.6, the B is 0.3 to 0.5, and the value A may be larger than a value B.(200)/{(200)+(220)+(111)}  [Equation 1] The diffraction intensity ratio of I (220) is defined by the following Equation 2.(220)/{(200)+(220)+(111)}  [Equation 2] In addition, in an iron (Fe)-nickel (Ni) alloy metal plate of a deposition mask for OLED pixel deposition according to an embodiment, the metal plate is formed of a plurality of crystal grains, and the maximum area of the crystal grains measured over the entire area of the metal plate is 700 μmor less.

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Seoul, South Korea

Hyun Joon Jung