Samsung Electronics Co., Ltd.

Hyun-Ho Cho

Kyung-Hyun Kim

Sang-rok Hah

Byoung-Moon Yoon

Hyun-Joon Kim

Sun-Yong Lee

Soo-Woong Lee

Jeong-Lim Nam

Dong-Seok Ham

Hee-Sun Chae

Kun-Hyung Lee

Jae-Hyung Jung

Hyeog-Ki Kim

Jung-Hun Nam

In-Jun Yeo

A wafer storage container includes a shell body including a first side body and a second side body that face, an upper body connected with upper parts of the first side body and the second side body, a rear body connected with an end of one side of each of the first side body and the second side body, and a lower body connected with lower parts of the first side body and the second side body, and configured to define an internal space together with the first side body, the second side body, the upper body, and the rear body.

Wafer storage container

An apparatus and method for manufacturing semiconductor devices are disclosed. In accordance with the invention, a wafer transfer device for transferring wafers from wafer storage containers to wafer processing equipment includes a flow chamber designed to reduce the amount of contaminants that can enter the wafer container. The wafer transfer apparatus provide two gas inlets for allowing two gases to flow through the flow chamber of the transfer apparatus. This results in a reduced amount of contaminants able to enter the wafer container, which in turn results in manufacture of devices with more reliable performance characteristics as well as high manufacturing yield.

Apparatus and method for processing wafers

A contamination control apparatus has a sprayer including at least one nozzle for spraying water, at least one eliminator having a passageway in which air is sprayed with the water to remove potential contaminants from the air, and a circulator for providing the sprayer with the water. The circulator includes a pH control device for adjusting the pH of the water fed to the sprayer, and an organic matter removing device for removing organic matter from the water. The contamination control apparatus can be advantageously employed in an air-conditioning system of a substrate processing facility.

Contamination control method and apparatus, and air-conditioning system of a substrate processing facility employing the same

Embodiments of the invention include a megasonic energy cleaning apparatus that has the ability to rotate the wafer to be cleaned, as well as rotate the cleaning probe during the cleaning process. Rotating the cleaning probe while the wafer is being cleaned is effective to increase the cleaning action of the apparatus while also minimizing damage to the wafer. Curved grooves, such as a spiral groove, can be etched into the cleaning probe to minimize forming harmful waves that could potentially cause damage to the wafer surface or to structures already made on the surface. Using a cleaning probe having a curved groove while also rotating the cleaning probe effectively cleans particles from a wafer while also limiting damage to the surface of the wafer.

Wafer cleaning system

Growing community of inventors

Suwon-si, South Korea

Hyun-Ho Cho