Lg Chem, Ltd

Hyun-Chul Chung

Won-Jae Moon

Hyung-Young Oh

Dae-Yeon Lee

Jae-Ik Song

Kyu-Chul Chung

Young-Kuk Kim

Young-Sik Kim

Chang-Hee Lee

Sang-Oeb Na

Heui-Joon Park

Yang-Han Kim

Kil-Ho Kim

Wook Jeong

Disclosed are an apparatus and a method for monitoring a glass plate polishing state. The apparatus may include a location measuring unit for measuring a location on a glass plate being polished by a polishing machine, a current measuring unit for measuring an electric current flowing into the polishing machine, a memory unit for storing a reference value of the electric current flowing into the polishing machine for each polishing location of the glass plate, and a control unit for determining whether a polishing state is faulty, by comparing a value of the electric current measured by the current measuring unit for each polishing location measured by the location measuring unit with a corresponding reference value of the electric current stored in the memory unit for each polishing location.

Apparatus and method for monitoring glass plate polishing state

A lower unit for a glass polishing system includes a support installed to a rotatable turntable, and a carrier having a supporting part for supporting a glass to be polished, and a placing part formed in a surface opposite to the supporting part and fixed and placed to the support.

Lower unit for glass polishing system and glass polishing method using the same

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Cheongju-si, South Korea

Hyun-Chul Chung