Applied Materials, Inc.

Hyun Chan Park

Thomas Gebele

Ajay Sampath Bhoolokam

According to one aspect of the present disclosure, a method of coating a substrate () with at least one cathode assembly () having a sputter target () and a magnet assembly () that is rotatable around a rotation axis (A) is provided. The method comprises: Coating of the substrate () while moving the magnet assembly in a reciprocating manner in a first angular sector (); and subsequent coating of the substrate () while moving the magnet assembly () in a reciprocating manner in a second angular sector () different from the first angular sector (). According to a second aspect, a coating apparatus for performing said method is provided.

Method of coating a substrate and coating apparatus for coating a substrate

According to one aspect of the present disclosure, a method of coating a substrate with at least one cathode assembly having a sputter target and a magnet assembly that is rotatable around a rotation axis is provided. The method comprises: Coating of the substrate while moving the magnet assembly in a reciprocating manner in a first angular sector; and subsequent coating of the substrate while moving the magnet assembly in a reciprocating manner in a second angular sector different from the first angular sector. According to a second aspect, a coating apparatus for performing said method is provided.

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Alzenau, Germany

Hyun Chan Park