Fujifilm Corporation

Fuji Photo Film Company, Limited

Hyou Takahashi

Kazuyoshi Mizutani

Kunihiko Kodama

Shoichiro Yasunami

Kenji Wada

Kei Yamamoto

Naoya Sugimoto

Takayuki Kato

Toru Fujimori

Michihiro Shirakawa

Shinji Tarutani

Tsukasa Yamanaka

Fumiyuki Nishiyama

A positive photosensitive composition includes: a resin (A) whose dissolution rate in an alkaline developing solution increases by the action of an acid, the resin (A) containing an acid decomposable repeating unit represented by a general formula (I) and an acid nondecomposable repeating unit represented by a general formula (II); and a compound (B) capable of generating an acid upon irradiation with one of active rays and radiations: wherein Xarepresents one of a hydrogen atom, an alkyl group, a cyano group, and a halogen atom, Arepresents one of a single bond and a divalent connecting group, ALG represents an acid leaving hydrocarbon group, Xarepresents one of a hydrogen atom, an alkyl group, a cyano group, and a halogen atom, Arepresents one of a single bond and a divalent connecting group, and ACG represents an acid nonleaving hydrocarbon group.

Positive photosensitive composition and method of forming pattern using the same

An actinic ray-sensitive or radiation-sensitive resin composition comprises (A) a resin that exhibits an increased solubility in an alkali developer when acted on by an acid, and (B) at least two types of sulfonic acid generators that generate a sulfonic acid when exposed to actinic rays or radiation, wherein the two types of sulfonic acid generators (B) consist of sulfonic acid generators (B1) and (B2) satisfying the following requirements, namely the sulfonic acid generator (B1) generates a sulfonic acid composed of 9 to 20 elements with an acid strength (pKa) satisfying the relationship pKa&#x3c;&#x2212;3.50, and the sulfonic acid generator (B2) generates an acid composed of 17 or more elements with an acid strength (pKa) satisfying the relationship &#x2212;2.00&#x3e;pKa&#x2267;&#x2212;3.50, provided that no hydrogen atom is included in the number of elements of the generated acids.

Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using same

A resist composition comprises (A) a compound having a molecular weight of 3,000 or lower which has in its molecule a structure having two or more monovalent anions and a structure having two or more monovalent cations.

Resist composition and method of pattern formation with the same

A resist composition for an electron beam, EUV or X-ray comprising (A1) a compound that has a reduction potential higher than that of diphenyl iodonium salt and generates an acid upon irradiation of an actinic ray or radiation.

Resist composition for electron beam, EUV or X-ray

A chemical amplification resist composition comprising (A) a resin increasing the solubility in an alkali developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation, (C) a compound having a fluorine atom and a hydroxyl group, and a pKa value of from 4 to 15, and (D) a solvent, and a pattern-forming method using the same.

Chemical amplification resist composition and pattern-forming method using the same

A resist composition for immersion, comprises: (A) a resin of which solubility in an alkali developer increases under an action of an acid; (B) a photoacid generator; and (C) a mixed solvent containing an alkylene glycol alkyl ether carboxylate and a propylene glycol monomethyl ether.

Resist composition for immersion exposure and pattern formation method using the same

A positive resist composition comprising (A) a resin that increases solubility in an alkali developing solution by the action of an acid and (B-1) a compound having a structure represented by formula (I) defined in the specification.

Positive resist composition and pattern formation method using the same

A positive-working resist composition comprising (A) a resin that increases solubility in an alkali developing solution by the action of an acid, (B) a compound which generates an acid upon irradiation of an actinic ray or radiation, (C) a nonionic cyclic compound having at least one partial structure represented by the following formula (I) or (II) and at least having either a melting point of 35&#xb0; C. or more or a boiling point of 100&#xb0; C./10 mmHg or more: and (D) a solvent.

Positive-working resist composition

A positive resist composition of the present invention achieving significant performance improvements in high energy-beam lithography, which comprises a phenolic polymer having a property of being insoluble or hardly soluble in an aqueous alkali solution and becoming soluble in an aqueous alkali solution by the action of an acid, in which the phenolic polymer includes a repeating unit containing at least one selected from the group consisting of an acetal-protected phenolic hydroxyl group, a ketal-protected phenolic hydroxyl group, a tertiary ester-protected carboxyl group and a tetrahydropyranyl-protected carboxyl group; and a compound having a phenacylsulfonium structure and capable of generating an acid upon irradiation with one of actinic rays and radiation.

Positive resist composition

A stimulus sensitive composition containing a compound capable of generating an acid or a radical on receipt of an external stimulus, the compound being represented by the following formula (I): wherein Y represents a group having a bridged cyclic structure; Rand Reach independently represent a hydrogen atom, an alkyl group or an aryl group; Rand Rmay be taken together to form a ring; Yand Yeach independently represent an alkyl group or an aryl group; Yand Ymay be taken together to form a ring; and Xrepresents a non-nucleophilic anion.

Stimulus sensitive compound and stimulus sensitive composition containing the same

The resist composition of the present invention, ensuring excellent pattern profile and excellent isolation performance for use in the pattern formation by the irradiation of actinic rays or radiation, particularly, electron beam, X ray or EUV light, which comprising (A) a compound having a specific partial structure and a counter ion, the compound generating an acid upon irradiation of actinic rays or radiation.

Resist composition

A negative type resist composition comprising:

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Shizuoka, Japan

Hyou Takahashi