Electronics and Telecommunications Research Institute

Hyo Young Lee

Nak Jin Choi

Jung Hyun Lee

Jong Hyurk Park

Gyeong Sook Bang

Mi Hee Jeong

Kang Ho Park

Provided is a method of patterning a catalyst using nano imprint lithography. The method includes slurrying a catalyst, preparing a stamp for forming a catalyst pattern, forming the catalyst pattern by coating a substrate with the catalyst slurry, imprinting the stamp on the catalyst slurry and performing patterning simultaneously with calcination through nano imprint lithography, and drying the patterned catalyst. As the catalyst pattern is formed through the nano imprint lithography, a surface area of the catalyst increases and it is easy to pattern the catalyst according to the shape of the stamp.

Method for forming a catalyst pattern using nano imprint lithography

Provided are a method of manufacturing nanoelectrode lines. The method includes the steps of: sequentially forming an insulating layer, a first photoresist layer, and a drop-shaped second photoresist on a substrate; disposing an imprint mold having a plurality of molding patterns over the second photoresist; applying pressure to the mold to allow the second photoresist to flow into the mold patterns; irradiating ultraviolet (UV) light onto the mold to cure the second photoresist; removing the mold from the cured second photoresist and patterning the second photoresist; patterning the first photoresist layer using the patterned second photoresist as a mask; patterning the insulating layer; and forming a metal layer between the patterned insulating layers. In this method, metal electrode lines are formed between insulating layers using an imprint lithography process, so that nanoelectronic devices can be freed from crosstalk between the metal electrode lines.

Method of manufacturing nanoelectrode lines using nanoimprint lithography process

Provided are a compound for a molecular electronic device which includes a terpyridine-ruthenium organic metal compound including a thiol anchoring group of the formula below, a method of synthesizing the compound and a molecular electronic device including a molecular active layer obtained from the compound.  In the formula, Rand Rare each a thioacetyl group or a hydrogen atom, at least one of Rand Ris a thioacetyl group, and m and n are each integers from 0 to 20. The molecular active layer, which is formed by self-assembling the compound on an electrode surface, composes a switching element and a memory element.

Compound for molecular electronic device having thiol anchoring group, method of synthesizing the compound, and molecular electronic device having molecular active layer obtained from the compound

Provided is a method of fabricating a nanoimprint mold which can form sub-100 nm fine pattern structures. The method includes forming patterns on a first substrate using an E-beam lithography (EBL) process, and transferring the patterns formed on the first substrate to a second substrate using a nanoimprint lithography (NIL) process to complete an NIL mold. Accordingly, the method can easily fabricate the nanoimprint mold at low costs on a quartz or glass substrate, which is not suitable for an EBL process to produce sub-100 nm patterns, by utilizing the advantages of the EBL process with a resolution of tens of nanometers.

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Daejeon, South Korea

Hyo Young Lee