Canon Kabushiki Kaisha

Hyo Takahashi

Ken Ikegame

Masako Shimomura

Kenji Yabe

Yasunori Takei

Isamu Horiuchi

Takuma Kodoi

A photosensitive resin composition includes a cationically polymerizable compound, a photoacid generating agent having an anion portion and a cation portion, and a salt having a cation portion having either one of a quaternary ammonium structure and a quaternary phosphonium structure and an anion portion, wherein the anion portion of the salt is exchanged with the anion portion of a first acid derived from the anion portion of the photoacid generating agent to form a second acid having acid strength that is lower than acid strength of the first acid.

Negative photosensitive resin composition, pattern formation method, and liquid discharge head

A photosensitive resin composition includes (a) a compound polymerizable in the presence of an acid, and (b) a photoacid generating agent including an onium salt having a cationic part structure represented by formula (b1) below and an anionic part structure represented by formula (b2) below, wherein the component (b) absorbs 50% or more of the amount of 365 nm wavelength light absorbed by the photosensitive resin composition, 

Photosensitive resin composition, method for producing structure, and liquid discharge head

A photosensitive resin composition includes: a cation polymerizable compound; a photoacid generator having an anion portion represented by the chemical formula 1 and a cation portion, wherein R represents a hydrocarbon group which may be substituted with a fluorine atom and has a total carbon number of 1 to 30; X is selected from the group consisting of a carbon atom and a phosphorous atom; Y is selected from the group consisting of &#x2014;S(&#x2550;O)&#x2014;, &#x2014;O&#x2014;CF&#x2014;, &#x2014;C(&#x2550;O)&#x2014;CF&#x2014;, &#x2014;O&#x2014;C(&#x2550;O)&#x2014;CF&#x2014;, &#x2014;C(&#x2550;O)&#x2014;O&#x2014;CF&#x2014;, and a single bond; R has at least one fluorine atom when Y is &#x2014;S(&#x2550;O)&#x2014; or the single bond; m and n are integers selected from the group consisting of m+n=3 and n=0, 1, and 2 when X is the carbon atom; m and n are integers selected from the group consisting of m+n=6 and n=0 to 5 when X is the phosphorous atom; and R and Y may be different from each other when m is equal to or greater than 2; and a salt of an anion portion and a cation portion, wherein an acid strength of an acid derived from the anion portion is equal to or greater than that of hexafluorophosphoric acid and equal to or less than that of hexafluoroantimonic acid.

Photosensitive resin composition, method for manufacturing structural body, and liquid discharge head

Without being dependent on design changes, a liquid ejection head and a method of production thereof are provided in which when time-division driving, liquid drop landing deviance in the direction of printing is capable of being corrected. In order to achieve this, before performing an exposure in order to form an ejection port, after forming a cavity that is shifted with respect to the location at which the ejection port is formed, exposure is performed.

Liquid ejection head and method of production thereof

The manufacturing method includes forming, on a surface of a negative photosensitive resin layer formed on a substrate, a hollow having inclinations at both sides in a cross section taken along a plane perpendicular to a row direction of the ejection orifice, and then forming a latent image in the hollow, thereby forming the ejection orifice so that an angle between a side surface portion thereof and a normal to the outer opening in a cross section of the ejection orifice taken along a plane which passes through a center of the ejection orifice and is perpendicular to the row direction is larger than an angle between the side surface portion and the normal to the outer opening in a cross section of the ejection orifice taken along a plane which includes a center line of the ejection orifice in the row direction and is perpendicular to a substrate surface.

Growing community of inventors

Kawasaki, Japan

Hyo Takahashi