Dongjin Semichem Co., Ltd.

Hyo-Jung Roh

Hyun-Jin Kim

Jae-Hyun Kim

Jeong-sik Kim

Sang-Jeoung Kim

Jong-Kyoung Park

Dong-Kyu Ju

Deog-Bae Kim

Man-Ho Han

An isocyanurate compound for forming an organic anti-reflective coating layer, which has superior stability and etch rate at a high temperature, and which has a high refractive index, is represented by following Formula 1.  In Formula 1, R is independently a hydrogen atom or a methyl group, Ris independently a chain type or ring type saturated or unsaturated hydrocarbyl group of 1 to 15 carbon atoms containing 0 to 6 of hetero atoms, and Rindependently a chain type or ring type saturated or unsaturated hydrocarbyl group of 1 to 15 carbon atoms containing 0 to 15 of hetero atoms, wherein, Rcan have at least two bonding parts, and in the case that Rhas at least two bonding parts, the rest parts except Rof the compounds represented by Formula 1 can connect to the Rto form a polymer structure.

Isocyanurate compound for forming organic anti-reflective layer and composition including same

A polymer for forming an organic anti-reflective coating layer, which is soluble in alkali solutions so that an additional etching process of anti-reflective coating layer is not required, and a composition including the same are disclosed. The polymer for forming an organic anti-reflective coating layer has the following formula.  Wherein, Ris a hydrogen atom (H) or a methyl group (&#x2014;CH), Ris a sulfur atom (S) or an oxygen atom (O), Ris a group containing 1 to 20 carbon atoms and a terminal hydroxyl group, Ris an alkylene group or a cycloalkylene group, and if necessary, a hetero atom is contained therein, and a, b and c independently represent weight % of repeating units constituting the polymer, and are 1 to 98 weight %, 1 to 98 weight %, and 1 to 98 weight %, respectively.

Polymer for forming organic anti-reflective coating layer

A polymer which has siloxane group at a main chain thereof and a composition including the same, for forming an organic anti-reflective coating layer are disclosed. The polymer for forming an organic anti-reflective coating layer is represented by following Formula.  In Formula, R is hydrogen atom, C&#x2dc;Calkyl group, C&#x2dc;Calcohol group or epoxy group, Ris independently hydrogen atom, n is an integer of 1-50, Ris C&#x2dc;Calkyl group, C&#x2dc;Ccycloalkyl group, C&#x2dc;Caryl group or C&#x2dc;Carylalkyl group, Ris hydrogen atom, C&#x2dc;Calcohol group or epoxy group and POSS is a polyhedral oligosilsesquioxane.

Polymer for organic anti-reflective coating layer and composition including the same

A monomer for forming an organic anti-reflective coating layer, a polymer thereof and a composition including the same are disclosed. In a photolithography process, the organic anti-reflective coating layer absorbs an exposed light between a layer to be etched and a photoresist layer, and prevents a photoresist pattern from collapsing due to a standing wave generated under the photoresist layer. The polymer for forming an organic anti-reflective coating layer includes a repeating unit represented by Formula  wherein, Ris a hydrogen atom, a methyl group or an ethyl group, Ris a C&#x2dc;Calkylene group, a C&#x2dc;Ccycloalkylene group or a C&#x2dc;Caromatic hydrocarbon group, POSS is a polyhedral-oligomeric-silsesquioxane, and m is an integer of 2 to 110.

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Hwaseong-si, South Korea

Hyo-Jung Roh