K. C. Tech Co., Ltd.

Hyo Jun Jang

Jeong Gyu Lee

Jung Hun Kim

Provided is a cerium-based particle and a polishing slurry composition including the same. The cerium-based particle may include a self-assembly of fine particles and an organic material. The cerium-based particle is a spherical ceria powder connected by a crystalline network formed by a self-assembly of a fine particle. The cerium-based particle is a heat-treated self-assembly of fine particles. The moisture content of the self-assembly of the fine particles is 2% or less, and the temperature of the heat treating is in the range of 500° C. to 600° C.

Cerium-based particle and polishing slurry composition including the same

The present disclosure relates to cerium oxide abrasive particles and a polishing slurry composition, and more particularly, to cerium oxide abrasive particles comprising: an element cerium; and a modifier and satisfying the agglomeration ratios calculated from the relational expressions of the primary particle sizes and the secondary particle sizes, and a polishing slurry composition comprising the same.

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Gyeonggi-do, South Korea

Hyo Jun Jang