Samsung Electronics Co., Ltd.

Hyeun-Su Kim

Kyung-Ho Kim

Hyun-Seok Lee

Kweon-Jae Lee

Jong-Seok Lim

Jung-Hoon Sung

A mask including a mask substrate including a cell exposure region and a peripheral exposure region, the cell exposure region configured to expose a metal layer in a cell region of a semiconductor device, the peripheral exposure region configured to expose a metal layer in a peripheral region of the semiconductor device, a first mask pattern configured to expose the metal layer in the peripheral exposure region of the mask substrate to form a signal metal pattern, and a second mask pattern configured to expose the metal layer in the peripheral exposure region of the mask substrate to form a dummy metal pattern, the second mask pattern being adjacent to the first mask pattern, and the second mask pattern having a substantially same width as a width of the first mask pattern may be provided.

Mask and metal wiring of a semiconductor device formed using the same

Integrated circuit memory devices include sense amplifier arrays having layouts that are configured to support greater pitch between adjacent input/output lines, while maintaining high levels of integration density. A sense amplifier array is provided having first and second column select I/O blocks that are arranged in an alternating zig-zag layout sequence, with the first column select I/O blocks positioned in a first row of the sense amplifier array and the second column select I/O blocks positioned in a second row of the sense amplifier array. The sense amplifier array also includes an alternating zig-zag layout sequence of first and second N-type (or P-type) sense amplifier blocks that extends back-and-forth between the first and second rows. The zig-zag layout sequence of sense amplifier blocks is interleaved with the zig-zag layout sequence of the column select I/O blocks.

Growing community of inventors

Suwon-si, South Korea

Hyeun-Su Kim