Korea Electrotechnology Research Institute

Lg Electronics Inc.

Hyeon Taeg Kim

Jeong Woo Jeon

Sung Il Chung

Hyeon Seok Oh

Jong Moon Kim

Jong Min Shin

Sung Hee Kang

S A Nikiforov

Mitica Caraiani

Pan Kyeom Kim

Jun Hyun Hwang

Chang Rin Lee

Jong Kwon Kim

Hyun Seok Oh

Disclosed is an apparatus and method for low-temperature plasma immersion processing of a variety of workpieces using accelerated ions, wherein low-temperature plasma is distributed around a cylindrical workpiece placed in a chamber, the workpiece is enclosed with a housing including a multi-slot extracting electrode to isolate the workpiece from plasma, and a negative potential sufficient to induce sputtering is applied to the workpiece and the electrode, so that ions from plasma are accelerated within the sheath formed between the extracting electrode and plasma, pass through the slot part of the electrode and bombard the workpiece, thus polishing the surface of the workpiece. This apparatus and method is effective for surface smoothing to ones of nm of large cylindrical substrates particularly substrates for micro or nanopattern transfer. This method includes plasma cleaning, surface activating, surface smoothing, dry etching, deposition, plasma immersion ion implantation and deposition within a single or multi chamber.

Plasma immersion ion milling apparatus and method

The present invention provides a cylindrical magnetic levitation stage and an exposure apparatus, which can form a nanoscale pattern of a large area directly on the surface of a large cylinder. The present invention provides an exposure apparatus including a new type of cylindrical magnetic levitation stage, which can levitate, rotate, and move a cylinder in the axial direction by the principle of magnetic levitation in a non-contact manner and form a nanoscale pattern on the surface of the cylinder, and a light source for irradiating light on the surface of the cylinder, thereby reducing the position error of the cylindrical magnetic levitation stage to a nanoscale size and correcting the error caused by mechanical processing in real time. Moreover, the present invention provides an exposure apparatus, which includes a differential vacuum means combined with the cylindrical magnetic levitation stage to create a partial vacuum environment between the light source and the surface of the cylinder, and thus it is possible to employ light sources such as X-rays, electron beams, extreme ultraviolet (EUV) rays, etc.

Cylindrical magnetic levitation stage and lithography

A refrigerating system for a refrigerator is disclosed. The refrigerator includes a compressor that compresses refrigerant, a condenser connected to the compressor that condenses compressed refrigerant, an expansion valve connected to the condenser that expands condensed refrigerant, freezing chamber and refrigerating chamber evaporators connected to the expansion valve that cool air in a freezing chamber and a refrigerating chamber by using refrigerant, respectively, and a regulating valve between the condenser and the refrigerating chamber evaporator that regulates refrigerant supply to the refrigerating chamber evaporator, thereby providing a refrigerating system for a refrigerator having high efficiency.

Refrigerating system for refrigerator

Growing community of inventors

Gyeongsangnam-do, South Korea

Hyeon Taeg Kim