Samsung Electronics Co., Ltd.

Hyeon Kyun Noh

Changwook Jeong

In Huh

Min-Chul Park

Sanghoon Myung

Hyunjae Jang

Ji Young Kim

Dong Jin Lee

Bong Soo Kim

Moon Young Jeong

Provided is a simulation method performed by a process simulator, implemented with a recurrent neural network (RNN) including a plurality of process emulation cells, which are arranged in time series and configured to train and predict, based on a final target profile, a profile of each process step included in a semiconductor manufacturing process. The simulation method includes: receiving, at a first process emulation cell, a previous output profile provided at a previous process step, a target profile and process condition information of a current process step; and generating, at the first process emulation cell, a current output profile corresponding to the current process step, based on the target profile, the process condition information, and prior knowledge information, the prior knowledge information defining a time series causal relationship between the previous process step and the current process step.

Simulation system for semiconductor process and simulation method thereof

A semiconductor device is provided. The semiconductor device includes a first substrate, an active region defined by an isolation film in the first substrate, an oxide semiconductor layer on the first substrate in the active region, and not comprising silicon, a recess inside the oxide semiconductor layer, and a gate structure filling the recess, comprising a gate electrode and a capping film on the gate electrode, and having an upper surface on a same plane as an upper surface of the active region.

Semiconductor device

Growing community of inventors

Hwaseong-si, South Korea

Hyeon Kyun Noh