Cheil Industries Inc.

Hye-Won Kim

Sang-jun Choi

Youn-Jin Cho

Seung-Wook Shin

A photosensitive polymer, the photosensitive polymer including repeating units represented by Formulae 1 to 3: wherein Rand Rare independently hydrogen or methyl, Ris a C4 to C20 acid-labile group, Ris a lactone-derived group, AR is a substituted or unsubstituted phenyl ring, or a substituted or unsubstituted aryl having from two to three fused aromatic rings, carbon Cis bonded directly to an aromatic ring of AR, l, m, and n are positive integers, l/(l+m+n) is about 0.1 to about 0.5, m/(l+m+n) is about 0.3 to about 0.5, and n/(l+m+n) is about 0.1 to 0.4.

Photosensitive polymer, resist composition, and associated methods

A (meth)acrylate compound having an aromatic acid-labile group, the (meth)acrylate compound being represented by the following Formula 1: In Formula I, Ris hydrogen or methyl, Ris hydrogen, a substituted or unsubstituted alkyl, or a substituted or unsubstituted aryl, Ris hydrogen, a substituted or unsubstituted alkyl, or a substituted or unsubstituted aryl, AR is a substituted or unsubstituted phenyl, or a substituted or unsubstituted aryl having from two to four fused aromatic rings, and carbon Cis bonded directly to an aromatic ring of AR.

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Uiwang-si, South Korea

Hye-Won Kim