Samsung Electronics Co., Ltd.

Hye-Kyoung Lee

Hoon Tae Kim

Sang-Gyun Woo

Dong-Seok Nam

Il-Yong Jang

Bang-Won Lee

In-Hwan Hwang

Yi-Sung Bae

Halftone phase shift photomasks are provided including a substrate configured to transmit light; a shift pattern on the substrate, the shift pattern including a pattern area on a center portion of the substrate and a blind area disposed on a periphery of the substrate, the shift pattern of the blind area having a greater thickness than a thickness that of the pattern area, and being configured to partially transmit the light; and a light shielding pattern formed on the shift pattern in the blind area and being configured to shield the light. Related methods are also provided herein.

Halftone phase shift blank photomasks and halftone phase shift photomasks

Methods of fabricating halftone phase shift blank photomasks and halftone phase shift photomasks

An integrated PCM-CODEC circuit including a plurality of PCM subscriber lines consisting of a SLIC for interfacing a telephone line with a switching system, an impedance conformer and a PCM-CODEC, a common bus for transferring a telephone signal into or from a subscriber according to the time division rule for the timing of telephone line use, a telemetering signal source and a (synchronization signal for controlling portion of the telephone call called by the n'th subscriber. The PCM-CODEC circuit includes a buffer, a signal selector, an applied gain controller, an anti-aliasing filter, a telemetering signal filter, a BPF, a coder, a decoder, a LPF, a received-gain controller, a smoothing filter, an operational amplifier and a telemetering gate.

Integrated PCM-CODEC circuit with telemetering noise elimination

Growing community of inventors

Incheon, South Korea

Hye-Kyoung Lee