Dongjin Semichem Co., Ltd.

Hye Jung Park

Jong Dai Park

Jae Hyun Kim

Jung Min Choi

Hyun Goo Kong

Jong Chul Shin

Sung Hoon Jin

Min Gun Lee

Jin Hyuk Lim

Disclosed is a chemical-mechanical polishing slurry composition having a small change in pH over time under an acidic condition and thus being easy to store for a long time. The chemical-mechanical polishing slurry composition includes an abrasive; an amount of about 0.000006 to 0.01 weight % of an aluminum component based on the total weight of the polishing slurry composition; and water. The number of silanol groups on a surface of the abrasive and a content of the aluminum component satisfy the requirements of following Equation 1:0.0005&#x2264;()*100&#x2264;4.5,&#x2003;&#x2003;[Equation 1]

Polishing slurry composition

Disclosed herein are a chemical mechanical polishing slurry composition for chemical mechanical planarization of metal layers, which comprises a non-ionized, heat-activated nano-catalyst, and a polishing method using the same. The polishing slurry composition comprises: a non-ionized, heat-activated nano-catalyst which releases electrons and holes by energy generated in a chemical mechanical polishing process; an abrasive; and an oxidizing agent. The non-ionized heat-activated nano-catalyst and the abrasive are different from each other, and the non-ionized, heat-activated nano-catalyst is preferably a semiconductor material which releases electrons and holes at a temperature of 10 to 100&#xb0; C. in an aqueous solution state, more preferably a transition metal silicide selected from the group consisting of CrSi, MnSi, CoSi, ferrosilicon (FeSi), mixtures thereof, and most preferably, a semiconductor material such as nano ferrosilicon. The content of the content of the non-ionized, heat-activated nano-catalyst is 0.00001 to 0.1 wt % based on the total weight of the slurry composition.

Chemical mechanical polishing slurry composition including non-ionized, heat activated nano-catalyst and polishing method using the same

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Gyeonggi-do, South Korea

Hye Jung Park