Lg Display Co., Ltd.

Lg Electronics Inc.

Avaco Co., Ltd.

Amorepacific Corporation

Hwan Kyu Yoo

Sung Eun Kim

Byung Han Yun

Tae Hyun Lim

Hyun Joo Jeon

Ji Young Oh

Hyuk Sang Yoon

Tae Kyun Kwon

Cheon Soo Lee

Jae Hyun Kim

Jin Young Lee

Sung Won Yi

Jeong Eun Seo

Yang Sik Moon

Yonggil Shin

Kwang Jong Yoo

Young Sub Lee

Byeong Eok Hwang

Byeong Cheol An

Sang Eon Ahn

The present invention relates to a robot cleaner capable of receiving a user input setting a reference distance for detecting a surrounding environment of a space to be cleaned through an external control device, and controlling driving based on the user input, and a robot cleaner system including the same, and according to the present invention, the actuator of the robot cleaner is controlled based on the reference distance set by the user, so that the robot cleaner can be controlled not to fall into inability to drive according to a cleaning environment.

Robot cleaner and robot cleaning system including the same

A portable terminal case having a skin condition-measuring function is disclosed. The case includes a battery case; a bumper case coupled to the battery case; a moisture measurement unit for receiving moisture level information in the skin of a user from a moisture measurement sensor; a contact detection unit for receiving information on the presence or absence of a contact between the bumper case and the skin from a contact detection sensor; an environment measurement unit for receiving surrounding environment information from an environment information measurement sensor; and a control unit for collecting the moisture content and the environment information from the moisture measurement unit and the environment measurement unit.

Portable terminal case having skin condition-measuring function

A processing apparatus includes a loading chamber; a buffer chamber connected to the loading chamber; a first process chamber connected to the buffer chamber; and an unloading chamber connected to the first process chamber, wherein a processing path through the processing apparatus is a forward in-line path in a direction through the loading chamber, the buffer chamber, the first process chamber, and the unloading chamber.

Processing apparatus

A sputtering apparatus includes a susceptor for receiving a substrate, and a first target device disposed to be opposite to a center region of a substrate and at least second and third target devices disposed to be opposite to peripheral regions of the substrate, wherein the second and third target devices are rotatable.

Sputtering apparatus, method of operating the same, and method of manufacturing substrate using the same

A sputtering apparatus for depositing a target material on a substrate includes a chamber, a target in the chamber to provide the target material, a carrier to carry the substrate in the chamber to face the target, and a plurality of masks arranged along sides of the carrier and being movable back and forth with respect to the carrier.

Sputtering apparatus and driving method thereof

Provided is a support platform of a non-contact transfer apparatus. The support platform is arranged horizontally and includes first and second members adding a lift force to a first force for lifting peripheral portions of a transferred object, wherein the first force is lower than a second force lifting a central portion of the transferred object.

Support platform of non-contact transfer apparatus

There is provided a support platform of a non-contact transfer apparatus. The support platform of a non-contact transfer apparatus includes a plurality of first holes each having a plurality of sub-holes arranged in a radial direction and a plurality of second holes arranged in a line proximate the first holes.

A sputtering apparatus includes a susceptor having a substrate and a plurality of target devices facing the substrate and substantially parallel to each other, each target device being rotatable.

Sputtering apparatus, method of driving the same, and method of manufacturing substrate using the same

A sputtering apparatus comprises a substrate unit that includes a substrate on which a target material is deposited in a chamber and a target unit on which a plurality of target sections formed of the target material are arranged. The sputtering apparatus further comprises a cathode plate that supplies electric power to surfaces of the plurality of target sections and a plurality of gas supply ports provided on regions between the plurality of target sections.

Growing community of inventors

Gyeonggi-do, South Korea

Hwan Kyu Yoo