Skhynix Inc.

Hwa-Chul Lee

Dae-Sik Park

Se-Han Kwon

Ill-Hee Joe

A method for fabricating a semiconductor device includes preparing a substrate which includes a memory cell region and a peripheral circuit region; forming a buried word line in the substrate in the memory cell region; forming a planar gate structure over the substrate in the peripheral circuit region; forming a bit line structure over the substrate in the memory cell region; forming a first air spacers over a sidewalls of the planar gate structure; and forming a second air spacers over a sidewalls of the bit line structure.

Growing community of inventors

Gyeonggi-do, South Korea

Hwa-Chul Lee