Etamax Co., Ltd

Huyndon Jung

Youngbeom Kim

Min-jung Lee

Stack fault inspection apparatus and method are disclosed. The apparatus includes a sample stage fixing the silicon carbide substrate and allow the incident light to scan the substrate surface; an incident light source configured to irradiate a vertical illumination light of a wavelength corresponding to an energy greater than a band gap energy of the substrate to at least a portion of a surface of the substrate in a direction substantially perpendicular to the surface of the substrate; a photomultiplier tube (PMT) configured to obtain a photoluminescence mapping image having a wavelength corresponding to the band gap energy of the substrate from the surface of the substrate; and a controller configured to process the mapping image and identify stacking faults.

Defect classification equipment for silicon carbide substrate using single incident light-based photoluminescence and defect classification method using the same

The present disclosure relates to a substrate defect measuring apparatus for detecting defects inside a substrate by photoluminescence and detecting defects outside the substrate by using the scattering of incident light for generating photoluminescence, and provides an apparatus for constituting an optical system in order to measure scattered and/or reflected light together in a procedure of measuring the photoluminescence, thereby shortening a measurement time.

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Suwon-si, South Korea

Huyndon Jung