Applied Materials, Inc.

Huutri Dao

John Patrick Holland

Alexander Miller Paterson

Xiaoping Zhou

Changhun Lee

Subhash Deshmukh

Sharma V Pamarthy

Jim Zhongyi He

Jivko Dinev

Roberto Cesar Cotlear

Dennis Koosau

Jeffrey William Dietz

Farid Abooameri

Robert Scott Clark

Kelly A McDonough

Siu Tang Ng

Declan Scanlan

David E Gutierrez

Plasma generation source employing dielectric conduit assemblies having removable interfaces and related assemblies and methods are disclosed. The plasma generation source (PGS) includes an enclosure body having multiple internal surfaces forming an internal chamber having input and output ports to respectively receive a precursor gas for generation of plasma and to discharge the plasma. A dielectric conduit assembly may guide the gas and the plasma away from the internal surface where particulates may be generated. The dielectric conduit assembly includes a first and second cross-conduit segments. The dielectric conduit assembly further includes parallel conduit segments extending from the second cross-conduit segment to distal ends which removably align with first cross-conduit interfaces of the first cross-conduit segment without leaving gaps. In this manner, the dielectric conduit assembly is easily serviced, and reduces and contains particulate generation away from the output port.

Plasma generation source employing dielectric conduit assemblies having removable interfaces and related assemblies and methods

Embodiments of the invention provide a method and apparatus, such as a processing chamber, suitable for etching high aspect ratio features. Other embodiments include a showerhead assembly for use in the processing chamber. In one embodiment, a processing chamber includes a chamber body having a showerhead assembly and substrate support disposed therein. The showerhead assembly includes at least two fluidly isolated plenums, a region transmissive to an optical metrology signal, and a plurality of gas passages formed through the showerhead assembly fluidly coupling the plenums to the interior volume of the chamber body.

Apparatus for etching high aspect ratio features

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San Jose, CA, United States of America

Huutri Dao