Samsung Electronics Co., Ltd.

Hunjae Jang

Kuntack Lee

Sunghyun Park

Younghoo Kim

Seungmin Shin

Taehong Kim

Seungho Kim

A wafer-cleaning apparatus includes an inner pin that supports a wafer. The wafer-cleaning apparatus further includes a nozzle disposed above the inner pin, a light source disposed under the inner pin, a window disposed between the light source and the wafer, and a window protector disposed between the wafer and the window. The nozzle supplies a chemical liquid to the wafer and the inner pin distributes a portion of the chemical liquid on an upper surface of the wafer by rotating the wafer. The window protector receives a portion of the chemical liquid that flows out of the wafer and the light source supplies the light to the wafer through the window protector and the window.

Growing community of inventors

Suwon-si, South Korea

Hunjae Jang