Taiwan Semiconductor Manufacturing Comp. Ltd.

Hung-Yu Yen

Keng-Chu Lin

A method for manufacturing a semiconductor device includes: forming a patterned mask on a patterned structure disposed on a substrate, such that a first mask portion and a second mask portion of the patterned mask are disposed on a first interconnect feature and a second interconnect feature of the patterned structure, respectively; and subjecting the patterned mask to a plasma treatment process such that the first and second mask portions are deformed to form a capping portion to cap a recess disposed between the first and second interconnect features so as to form an air gap.

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Hsinchu, Taiwan

Hung-Yu Yen