National Applied Research Laboratories

Hung-Ping Chen

Chien-Nan Hsiao

Wen-Hao Cho

Han-Chang Pan

Po-Kai Chiu

An antireflection structure is provided. The antireflection structure includes a substrate layer having a substrate refractive index; a first inorganic layer disposed on the substrate layer and having a first refractive index different from the substrate refractive index, where a thickness of the first inorganic layer is in a range of 1 to 40 nm; and a second inorganic layer disposed on the first inorganic layer and having a second refractive index different from the first refractive index.

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Yongkang, Taiwan

Hung-Ping Chen