Chinese Academy of Sciences

Shanghai Micro Electronics Equipment Co., Ltd.

Shanghai Keyan Phosphor Technology Co., Ltd.

Institute of Microbiology and Epidemiology, Academy of Military Medical Sciences, Chinese Pla

Huijie Huang

Aijun Zeng

Ming Chen

Ya Cheng

Feng Chi

Lei Zhou

Ying Chu Wang

Linglin Zhu

Lihua Huang

Zhonghua Hu

Baoxi Yang

Yan Zheng

Fang Zhang

Ying Wang

Ruifang Fang

Zhaogu Cheng

Jianfang Chen

Liqun Chen

Jingyu Bian

Yunbo Zhang

Shufan Geng

Ruifu Yang

Mingxing Chen

Tiecheng Liu

Jingpei Hu

Youbao Zhang

Zongmin Du

Qiang Song

Longhai Liu

Yanfen Xiao

Provided are an integrated super-resolution laser direct-writing device and a direct-writing method. The integrated super-resolution laser direct-writing device includes a first continuous laser, a first optical fiber coupler, a mono-mode optical fiber, a second continuous laser, a second optical fiber coupler, a first annular photonic crystal fiber, a bifurcated optical fiber, a lens group, a first dichroic mirror, an LED light source, a lens, a second dichroic mirror, an auto-focusing module, a third dichroic mirror, a third optical fiber coupler, a square-law graded index fiber, a nanometer displacement table, a second lens, a CMOS camera and a control system. According to the present invention, an original large direct-writing device based on a free optical path can achieve optical fibers of key devices and integration of systems and can be better applied to the field of laser direct-writing.

Integrated super-resolution laser direct-writing device and direct-writing method

An illumination device comprises a laser source, a beam expander, a micromirror array having a first control system, a fast steering mirror having a second control system, a diaphragm array, a microlens array, an illumination lens group, and a reflection mirror sequentially along the propagation direction of the laser beam. The first control system comprises a first computer controlling each micromirror on the micro-mirror array through the micromirror array controller to rotate in two-dimensional directions so expanded beam forms desired intensity patterns on the diaphragm array after reflected by the micromirror array and fast reflection mirror and a micromirror array controller; the second control system comprises a second computer controlling the reflection mirror of the fast steering mirror to rotate through fast steering mirror controller so created intensity pattern moves relative to the diaphragm array and a fast steering mirror controller. Method for using the illumination device is provided.

Illumination device and method for using the same in the projection lithography machine

Illumination system for a lithographic projection exposure step-and-scan apparatus comprising a light source, a pupil shaping unit, a field defining unit, a first lens array, a first slit array, a second lens array, a third lens array, a second slit array, a fourth lens array, a condenser lens, and a scanning drive unit sequentially arranged along the light beam propagation direction. The illumination system reduces requirements on lens processing, slit scanning speed, and slit scanning precision, therefore may be implemented more easily.

Illumination system for lithographic projection exposure step-and-scan apparatus

A lithography illumination system, along the transmission direction of the laser light, successively having a laser light source, a collimating and expanding unit, a pupil shaping unit, a first micro-lens array, a micro-integrator rod array, a micro-scanning slit array, a second micro-lens array, a condenser lens group, a mask, and and a motion control unit for controlling the motion of the micro scanning slit array.

Lithography illumination system

A lithography pupil shaping optical system and method for generating off-axis illumination mode. The invention is composed of illumination mode generation unit, rotatable wave plate, polarization beam splitter unit, ring I generation unit and ring II generation unit. Through selecting corresponding diffractive optical element and appropriate adjustment, this invention can generate various illumination modes including single ring illumination mode and double ring illumination mode. The intensity at pupil plane and the inner and outer diameters of the off-axis illumination mode can be adjusted continuously.

Lithography pupil shaping optical system and method for generating off-axis illumination mode

Device and method for measuring phase retardation distribution and fast axis azimuth angle distribution of birefringence sample in real time. The device consists of a collimating light source, a circular polarizer, a diffractive beam-splitting component, a quarter-wave plate, an analyzer array, a charge coupled device (CCD) image sensor and a computer with an image acquisition card. The method can measure the phase retardation distribution and the fast axis azimuth angle distribution of the birefringence sample in real time and has large measurement range. The measurement result is immune to the light-intensity fluctuation of the light source.

Device and method for measuring phase retardation distribution and fast axis azimuth angle distribution in real time

A detection apparatus and method for testing optical performance of beam shaping element used in ultraviolet lithography machine; The apparatus comprises visible wavelength laser and other optical units placed along the optical axis including, in order from laser side, (a) beam expander lens group, (b) beam splitter, (c) first far field imaging lens, (d) adjustable aperture or (e) CCD image sensor, (f) second far field imaging lens and (g) energy sensor. The detection apparatus is suitable be employed to detect the optical performance of beam shaping element working at any ultraviolet band, and provides the features of low cost, easy operation and quick measurement.

Device and method for detecting optical performance of beam shaping element

Four-axis four-subdividing interferometer comprising a four-axis light splitting module and an interference module which are sequentially arranged along the incident direction of polarization orthogonal double-frequency laser. The four-axis light splitting system comprises three 50% plane beam splitters and three 45-degree plane reflecting mirrors. The invention comprises a four-axis four-subdividing plane mirror interferometer and a four-axis four-subdividing differential interferometer. In the differential interferometer, an adjustable 45-degree reflecting mirror is used to guide the reference light to a reference reflecting mirror which is arranged in the same direction as a measurement mirror and fixed on the moving object.

Four-axis four-subdividing interferometer

Six-axis four-subdividing interferometer comprising a six-axis light splitting system and an interference module which are sequentially arranged along the incident direction of polarization orthogonal double-frequency laser, wherein the six-axis light splitting system comprises five 45-degree plane beam splitters and four 45-degree full-reflecting mirrors.

Six-axis four-subdividing interferometer

A method of indirect emission by nano-materials includes providing an infrared up-conversion phosphor 1 (weight ratio) and a long-wave ultraviolet phosphor 0.01-10 (weight ratio); treating both surfaces of the infrared up-conversion phosphor and the long-wave ultraviolet phosphor; mixing the infrared up-conversion phosphor and the long-wave ultraviolet phosphor; exciting the infrared up-conversion phosphor by a near-infrared laser with a wavelength of 980 mn to emit blue light as a secondary excitation lightsource; exciting the long-wave ultraviolet phosphor by the blue light to emit a visible light. Biological reactions can be conveniently detected by detecting the visible light.

Method of indirect emission by nano-materials

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Shanghai, China

Huijie Huang