Nederlandse Organisatie Voor Toegepast-natuurwetenschappelijk Onderzoek Tno

Asml Netherlands B.v.

Huibert Blokland

Arno Willem Frederik Volker

Lun Kai Cheng

Nicolaas Antonius Allegondus Johannes Van Asten

Luberthus Ouwehand

Alexander Charles Franciscus Anna Van Well

Elke Van Loenhout

Oana Cristina Balan

Machiel Jacobus Johannes Viguurs

Hans Baltus Bakker

Paul Louis Maria Joseph Van Neer

Joost Conrad Lötters

Arjen Boersma

Johannes Fransiscus Maria Velthuis

Leon Ferdinand Gerard Geers

Renz Jeroen Van Ee

Jörgen Sweelssen

Gerrit Blacquiere

Theodoor Peter Martijn Hunter

Joost Conrad LÖTTERS

The invention relates to a capacitive sensing material and a method of manufacturing thereof, a capacitive sensing coating formulation, a capacitive chip, a capacitive sensor, a method for manufacturing a coated chip, a method for analysing the composition of a gaseous mixture, a use of particles comprising titanium oxide and platinum for sensing hydrogen, and a use of capacitive sensing material for detecting a gas leak. The capacitive sensing material comprises composite particles wherein porous titanium dioxide is at least in part coated with platinum particles.

Capacitive hydrogen sensor

A hollow structure like a pipeline is inspected using an array of ultrasound transmitters located within the hollow structure distributed over different radial directions from a center of the array. Parameters such as ellipticity, defining a shape and/or orientation of an inner surface of a wall of the hollow structure are first determined based on measured delays between transmission of ultrasound pulses from the transmitters to reception of first reflections of those ultrasound pulses. Parameters may be used that define an elliptically shaped cross-section of the inner wall surface for example. Next an ultrasound wavefront composed of joint transmissions from the transmitters along at least a sector of the array is transmitted, using relative time delays between waves transmitted by the respective ones of the transmitters to compensate for estimated differences between travel times from the transmitters to the shape defined by the parameters. Reflections of the joint transmissions are detected. The reflections may be detected by computing derivatives with respect to frequency of phase values of Fourier transforms of the reflected signals and detecting peaks in the size of the computed derivatives of the phase values.

Ultrasonic pipeline inspection system and method

Fluid flows through a conduit. To measure flow speed the fluid is heated at a heating location in the conduit with a time-dependent heating strength. A speed of sound in fluid flowing in the conduit is measured at a plurality of sensing locations downstream from said heating location. The flow speed of the fluid is determined from a delay with which the time dependence is detected in the sound speeds measured at said sensing locations. In an embodiment a frequency of the variation of heating strength that is used to determine the flow speed is selected automatically dependent on the flow speed and/or other circumstances.

Fluid flow meter using thermal tracers

A fluid flow meter is described that uses thermal tracers to measure flow speed. For fluid flowing through a conduit, the fluid is heated at a heating location in the conduit with a time-dependent heating strength. A speed of sound in fluid flowing in the conduit is measured at multiple sensing locations downstream from said heating location. The flow speed of the fluid is determined from a delay with which the time dependence is detected in the sound speeds measured at the sensing locations. A frequency of the variation of heating strength that is used to determine the flow speed is selected automatically based on the flow speed and/or other circumstances.

A level sensor for determining a height of a substrate. In one configuration, the level sensor forms part of a lithographic apparatus that includes a projection lens system. The level sensor generates one or more measurement beams and directs the measurement beam to a measurement spot on a substrate having a first reflecting surface, and produces a reflected measurement beam. The level sensor also generates one or more reference beams. A detector detects both the reflected measurement beam and the reference beam, respectively, and produces a measurement signal and a reference signal, respectively, the measurement signal being indicative for the height at the measurement spot. A processor that receives these signals and corrects the measurement signal based on the reference signal. In one configuration, the level sensor has an optical element arranged to direct the reference beam towards a detection branch via an optical reference path arranged to be insensitive to the position of the projection lens system and the first reflecting surface. In one configuration, the level sensor is configured to direct the measurement beam and reference beam along optical paths that are at least partially substantially equal in at least one of the reference branch and the projection branch.

Method for correcting disturbances in a level sensor light path

The invention relates to a level sensor for determining a height of a substrate. The level sensor generates one or more measurement beam and directs the measurement beam to a measurement spot on the substrate and produces a reflected measurement beam. The level sensor also generates one or more reference beams. A detector detects both the reflected measurement beam and the reference beam, respectively, and produces a measurement signal and a reference signal, respectively, the measurement signal being indicative for the height at the measurement spot. A processor that receives these signals and corrects the measurement signal based on the reference signal. The level sensor has an optical arrangement in a predetermined area close to where the substrate is to be located. The measurement beam and the reference beam propagate along substantially equal optical paths of propagation in the predetermined area. The optical arrangement deviates the reference beam from the substantially equal optical paths of propagation in the predetermined area such that the at least one reference beam does not hit the substrate.

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Noordeloos, Netherlands

Huibert Blokland