Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd.

Shenzhen China Star Optoelectronics Technology Co., Ltd.

Huawei Technologies Co., Limited

Foxconn Technology Co., Ltd.

Tcl China Star Optoelectronics Technology Co., Ltd.

Fu Zhun Precision Industry (Shen Zhen) Co., Ltd.

The Northern Research Institute of Njust

Hui Xia

Zhichao Zhou

Meng Chen

Jian Mg Cheng

Zhigang Huang

Zhiwei Tan

Min Li

Jinhui Zhang

Xiaojun Yan

Shu Jhih Chen

Jian Cheng

Tienchun Huang

Shuo Sun

Jing Xu

Jili Yue

Xiangsheng Xu

Yan-Shuang Lv

Qiuying Xia

Feng Zan

The present disclosure provides a positive electrode of lithium-ion battery, an all-solid-state lithium-ion battery and a preparation method thereof, and an electrical device. The all-solid-state lithium-ion battery of the present disclosure includes a positive electrode, a solid electrolyte, and a negative electrode; wherein the positive electrode includes a positive electrode current collector and a positive electrode material layer provided on a surface of the positive electrode current collector, a positive electrode active material in the positive electrode material layer is a manganese oxygen compound; and the negative electrode includes a negative electrode current collector and a negative electrode material layer provided on a surface of the negative electrode current collector, a negative electrode active material in the negative electrode material layer is a titanium oxygen compound.

Positive electrode of lithium-ion battery, all-solid-state lithium-ion battery and preparation method thereof, and electrical device

The present invention teaches a pixel unit including thin film transistors (TFTs) and pixel electrodes corresponding to the TFTs. The pixel electrodes are connected to the source electrodes of the TFTs. Each pixel electrode includes multiple arc-shaped electrode units arranged at intervals along an axial direction around a periphery of a corresponding TFT. The electrode units are electrically connected together. The present invention adopts arc-shaped pixels (similar to concentric circles) so that liquid crystal molecules are closer to being isotropic. Then, by having different vertical alignment (VA) TFT designs in the primary pixel region and secondary pixel region and utilizing the differences in W/L and capacitance, different voltage levels for primary pixel electrode and secondary pixel electrode are achieved. The color shift problem is improved and the viewing angle is enhanced.

Pixel unit, manufacturing method thereof, and display device

An array substrate and a method of manufacturing the same are provided. The array substrate includes a substrate, a gate layer, a first insulating layer, a gate tracking layer, and a second insulating layer. The method of manufacturing the array substrate includes a substrate providing step, a gate layer forming step, a first insulating layer forming step, a gate tracking layer forming step, and a second insulating layer forming step.

Array substrate and method of manufacturing same

The present disclosure proposes a thin film transistor and a related circuit. The thin film includes a gate, a drain and a source. The gate includes one or more gate units. The gate unit includes two or more strip-shaped gate branches, and a first gap is arranged between the two adjacent strip-shaped gate branches to separate them.

Thin film transistor and electrical circuit

The present invention provides an IPS TFT array substrate and a manufacturing method thereof. The manufacturing method of an IPS TFT array substrate of the present invention includes: forming a gate electrode, a scan line, a pixel electrode, and a common electrode with a first mask-involved operation, forming a first through hole and a second through hole in the gate insulation layer and an active layer with a second mask-involved operation, and forming a source electrode, a drain electrode, a data line, and a common electrode line with a third mask-involved operation. The present invention uses only three mask-involved operations to complete the manufacturing of an IPS TFT array substrate. Compared to the state of the art, the number of masks used is reduced, the manufacturing time is shortened, and thus the manufacturing cost is lowered. The IPS TFT array substrate of the present invention has a simple manufacturing process, a low manufacturing cost, and excellent electrical properties.

IPS thin-film transistor array substrate and manufacturing method thereof

A manufacturing method of TFT substrate and a TFT substrate are provided. The method provides a dual-gate structure symmetrically disposed on both sides of active layer, which prevents TFT threshold voltage from changing and improve TFT conduction state switching; by first manufacturing the active layer before the gate insulating layer to make the insulating layer directly grow on active layer, the contact interface between the gate insulating layer and active layer is improved, leading to further improving TFT conduction state switching. The TFT substrate makes the gate located between the source and the pixel electrode in vertical direction, and the dual-gate is symmetrically disposed on both sides of active layer to prevent TFT threshold voltage from changing and improve TFT conduction state switching, as well as improve the contact interface between the gate insulating layer and active layer, leading to further improving TFT conduction state switching.

Manufacturing method of TFT substrate and TFT substrate

A thin-film transistor and a manufacturing method for the same are disclosed. The method includes steps of: depositing a first metal layer on a substrate; depositing a semiconductor material layer on the first metal layer, and using a first photolithography process to perform a patterning process to the semiconductor material layer in order to form a semiconductor active layer depositing a second metal layer on the first metal layer and the semiconductor active layer, and using a second photolithography process to perform a patterning process to the first metal layer and the second metal layer in order to obtain a first electrode, a second electrode, and a third electrode, wherein the first electrode and the second electrode are disposed at an interval, the first electrode is disposed on the substrate, the second electrode is disposed between the substrate and the semiconductor active layer, and the third electrode is disposed on the semiconductor active layer, projections of the second electrode and the third electrode on a horizontal plane are overlapped; the first electrode is formed by the first metal layer and the second metal layer. The fabrication of the first electrode, the second electrode, the third electrode, and the active layer can be completed by only two photolithography processes, which reduce process steps and reduce cost.

Thin-film transistor and manufacturing method for the same

The present invention teaches a TFT array substrate and its manufacturing method including the following steps. A data line and a ring-shaped source electrode are formed on a substrate. A first insulation layer is formed on the substrate. A ring trough exposing the source electrode is formed on the first insulation layer. A semiconductor active layer is formed in the ring trough. A channel is formed on the first insulation layer in an area surrounded by the ring trough. A gate line, a gate electrode in the channel, and a drain electrode connected to the semiconductor active layer are formed on the first insulation layer. A second insulation layer is formed on the first insulation layer, and a pixel via is formed on the second insulation layer. A pixel electrode is formed on the second insulation layer, and is connected to the drain electrode through the pixel via.

TFT array substrate and manufacturing method thereof

The present invention provides a VA type TFT array substrate and a manufacturing thereof. The manufacturing method for a VA type TFT array substrate of the present invention comprises that three pixel electrodes are formed in one pixel. The three pixel electrodes are connected to the same TFT but located on different structure layers. Therefore, the driving capabilities to liquid crystals are different. In the present invention, the three pixel electrodes are used to adjust the liquid crystal transmittances of three regions in one pixel, which is beneficial of keeping the brightness uniformity of the pixel when seeing from different angels, thereby enhancing the viewing angle of the VA type LCDs. The VA type TFT array substrate of the present invention disposes three pixel electrodes are formed in one pixel, which is beneficial of enhancing the viewing angle of the VA type LCDs.

VA type TFT array substrate and the manufacturing method thereof

A method of manufacturing an array substrate is provided. The method divides an array substrate into a curing area and a stretchable area. A metal wiring corresponding to the stretchable area is made of a flexible conductive material, so as to reduce disconnection risk of the display panel during bending.

Array substrate and manufacturing method thereof

The disclosure provides a manufacturing method for a thin film transistor, wherein a manufacturing method for a data line and a source/drain specifically includes: S: respectively manufacturing a data line material film layer and a source/drain material film layer; S: manufacturing a photoresist material film layer; S: performing a half-tone method to etch the photoresist material film layer, forming a photoresist layer, and obtaining a first etching substrate; S: performing a 4-mask process to etch the first substrate, forming the data line on a gate insulating layer, forming the source and the drain on an active layer, and forming a the back channel between the source and the drain to obtain the thin film transistor. The disclosure further provides a manufacturing method for an array substrate, wherein the manufacturing method for an array substrate includes the above-mentioned manufacturing method for a thin film transistor.

Manufacturing method of a thin film transistor and manufacturing method of an array substrate

The present application discloses an array substrate and a method of manufacturing the same. The array substrate includes a first insulating layer disposed on the substrate; a source electrode pattern disposed within the first insulating layer; an annular gate electrode pattern disposed on the first insulating layer and surrounded the periphery of the source electrode pattern; a second insulating layer covering on the annular gate electrode pattern; a semiconductor pattern disposed in the annular area of the annular gate electrode pattern, and is electrically connected to the exposed portion of the source electrode pattern, the semiconductor pattern is further electrical insulation to the annular gate electrode pattern through the second insulating layer; a pixel electrode disposed on the second insulating layer and electrically connected to a side of the semiconductor pattern remote from the substrate.

Array substrate and method of manufacturing the same

The present disclosure discloses a manufacturing method of a thin film transistor, including: forming a gate layer on a substrate; forming a gate insulating layer on the gate layer and the substrate; forming an active layer on the gate insulating layer; and simultaneously forming a source and a drain formed on the active layer by a combination of a chemical plating method and a lift-off method. In the present disclosure, the chemical plating method is combined with the lift-off method, so that the wet-etching method is not used for forming the source and the drain, and thus the IGZO at the channel is not required to be protected by the etching-stop-layer. Therefore, while simplifying the production process, but also can reduce costs.

Thin film transistor and manufacturing method thereof

An array substrate includes a pixel structure formed on a substrate. The pixel structure is provided with a transistor region and a pixel region. A source electrode and a drain electrode in the pixel region are located in the transistor region and insulated from each other. A data line is electrically connected to the drain electrode. A pixel electrode is located in the pixel region and electrically connected to the source electrode. A copper metal layer is deposited on the data line and a drain electrode; a semiconductor active layer is formed between the source and drain electrodes and respectively connecting with the source and drain electrodes; a gate insulating layer overlying the data line and the drain electrode. The transparent electrode layer, the copper metal layer and the semiconductor active layer; the gate line and the gate electrode electrically connect to each other on the gate insulating layer.

Array substrate, fabricating method for the same and display device

The present invention provides an FFS type TFT array substrate and a manufacturing method thereof. The manufacturing method for an FFS type TFT array substrate of the present invention comprises that a gate electrode, a scanning line, a common electrode, and a common electrode line are formed in one photomask process. Comparing with the conventional art, the present invention simplifies the manufacturing process, with fewer photomasks, and a shorter processing time, therefore, the production cost is low. The fabrication process of the FFS type TFT array substrate of the present invention is simple, has low production cost and excellent electrical performance.

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Shenzhen, China

Hui Xia