Xilinx, Inc.

Hui-Wen Lin

Nui Chong

Henley Liu

Yan E Wang

Gamal Refai-Ahmed

Suresh Ramalingam

Myongseob Kim

Cheang-Whang Chang

Ping-Chin Yeh

Ho Hyung Lee

Examples described herein provide a method for reducing warpage when stacking semiconductor substrates. In an example, a first substrate is bonded with a second substrate to form a stack. The first substrate comprises a first semiconductor substrate, and the second substrate comprises a second semiconductor substrate. The second semiconductor substrate is thinned, and a first trench is etched into a backside of the thinned second semiconductor substrate. A first stressed material is deposited into the first trench.

Warpage reduction

Examples described herein generally relate to testing of bonded wafers and structures implemented for such testing. In an example method, power is applied to a first pad on a stack of bonded wafers. A wafer of the stack includes a process control monitor (PCM) region that includes structure regions. Each structure region is a device under test region, dummy region, and/or chain interconnect region (CIR). The stack includes a serpentine chain test structure (SCTS) electrically connected between first and second metal features in the wafer in first and second CIRs, respectively, in the PCM region. The SCTS includes segments, one or more of which are disposed between neighboring structure regions in the PCM region that are not the first and second CIRs. A signal is detected from a second pad on the stack. The first and second pads are electrically connected to the first and second metal features, respectively.

Testing of bonded wafers and structures for testing bonded wafers

Integrated circuit (IC) dies and method for manufacturing the same are described herein that mitigate pattern loading effects during manufacture. In one example, the IC includes a die body having a first circuit block separated from an adjacent second circuit block by a buffer zone. The first and second circuit blocks have first and second transistors that are at least partially fabricated from a gate metal layer and disposed immediately adjacent the buffer zone. A dummy structure is formed in the buffer zone and is also at least partially fabricated from the gate metal layer. An amount of gate metal layer material in the dummy structure is selected to mitigate differences in the amount of gate metal layer material in regions of first and second circuit blocks that neighbor each other across the buffer zone.

IC die with dummy structures

Examples described herein provide for an electronic device apparatus with multiple thermally conductive paths for heat dissipation. In an example, an electronic device apparatus includes a package comprising a die attached to a package substrate. The electronic device apparatus further includes a ring stiffener disposed around the die and on the package substrate, a heat sink disposed on the package, and a wedge disposed between the heat sink and the ring stiffener.

Growing community of inventors

San Jose, CA, United States of America

Hui-Wen Lin