Globalfoundries Singapore Pte. Ltd.

Seagate Technology Incorporated

United Microelectronics Corp.

Hui Liu

Wanbing Yi

Curtis Chun-I Hsieh

Zheng Zou

Mahesh Bhatkar

Jin Quan Shen

Yong Peng Chng

Qun Ying Lin

Chin Chuan Neo

Alex Kai Hung See

Wen Zhan Zhou

Tse Jen Lee

An overlay target includes a plurality of working zones, a plurality of holes in each of the working zones, and a first layer filling in the plurality of holes. The plurality of holes are not filled up by the first layer, and a plurality of spaces are reserved in the plurality of holes.

Overlay target and overlay method

A data storage device that includes a data storage medium and a controller communicatively coupled to the data storage medium. The controller is configured to receive commands from a host and to detect a hung state in the data storage device. The controller is also configured to determine an execution status of a command, of the commands from the host, associated with the hung state. The controller is further configured to dynamically carry out a self-recovery operation in the data storage device to clear the hung state. The self-recovery operation includes steps that depend upon the execution status of the command associated with the hung state.

Storage device self-recovery exception engine

Integrated circuits and methods of producing the same are provided. In an exemplary embodiment, a method for producing an integrated circuit includes forming a memory cell with a memory cell upper surface. A capping layer is formed overlying the memory cell, and a portion of the capping layer is removed to expose the memory cell upper surface. A memory cell etch stop is formed overlying the memory cell upper surface after the portion of the capping layer is removed to expose the memory cell upper surface. The memory cell etch stop is removed from overlying the memory cell upper surface, and an interconnect is formed in electrical communication with the memory cell.

Integrated circuits with magnetic tunnel junction memory cells and methods for producing the same

A method and a device are provided for diffracting incident light from a lithographic scanner in an IC process flow. Embodiments include forming a diffraction grating in a first layer on a semiconductor substrate; and forming a plurality of lithographic alignment marks in a second layer, overlying the first layer, wherein the diffraction grating has a width and a length greater than or equal to a width and length, respectively, of the plurality of lithographic alignment marks.

Litho scanner alignment signal improvement

Growing community of inventors

Singapore, Singapore

Hui Liu