Asml Netherlands B.v.

Hugues Poincelin

Erik Roelof Loopstra

Leon Martin Levasier

Bernardus Antonius Johannes Luttikhuis

Maurice Willem Jozef Etiënne Wijckmans

Petrus Rutgerus Bartray

Josephus Jacobus Smits

Peter Gerardus Jonkers

Johannes Bernardus Ridder

Dennis Jozef Maria Paulussen

Anthonie Aantjes

Fransiscus Theresia Noel Heusschen

A lithographic apparatus includes a projection system configured to project an image onto a substrate, a substrate table configured to support the substrate, a first chamber that at least partially surrounds the projection system, and a second chamber that at least partially surrounds the substrate table and a first frame. The apparatus includes a base frame configured to support the second chamber, and an intermediate frame coupled to the base frame. The intermediate frame is configured to separate the first chamber and the second chamber. The apparatus includes a support coupled to the first frame. The support is configured to support the first chamber through a coupled opening in the intermediate frame and the second chamber.

Lithographic apparatus and device manufacturing method

Growing community of inventors

Asnières sur Seine, France

Hugues Poincelin