Asml Netherlands B.v.

Hugo Thomas Looijestijn

Everhardus Cornelis Mos

Frank Staals

Thomas Theeuwes

Roy Werkman

Jochem Sebastiaan Wildenberg

Maxim Pisarenco

Erik Johannes Maria Wallerbos

Davit Harutyunyan

Vahid Bastani

Fuming Wang

Cornelis Johannes Rijnierse

Tom Van Hemert

Fei Jia

Wouter Jan Cornelis Vijselaar

A method of using a dual stage lithographic apparatus, wherein the lithographic apparatus includes: two substrate supports each arranged to move and support a substrate, a measure field in which selectively one of the two substrate supports is positioned to measure a feature of the substrate supported by the respective one of the two substrate supports, and an expose field in which selectively one of the two substrate supports is positioned to expose the substrate supported by the respective one of the two substrate supports to a patterned beam of radiation, the method including thermal relaxation of a substrate loaded on one of the two substrate supports, wherein the thermal relaxation is at least partially performed at the expose field and/or in transfer between the measure field and the expose field.

Method of using a dual stage lithographic apparatus and lithographic apparatus

A method, system and program for determining a fingerprint of a parameter. The method includes determining a contribution from a device out of a plurality of devices to a fingerprint of a parameter. The method includes obtaining parameter data and usage data, wherein the parameter data is based on measurements for multiple substrates having been processed by the plurality of devices, and the usage data indicates which of the devices out of the plurality of the devices were used in the processing of each substrate; and determining the contribution using the usage data and parameter data.

Method for determining contribution to a fingerprint

A method, system and program for determining a fingerprint of a parameter. The method includes determining a contribution from a device out of a plurality of devices to a fingerprint of a parameter. The method including: obtaining parameter data and usage data, wherein the parameter data is based on measurements for multiple substrates having been processed by the plurality of devices, and the usage data indicates which of the devices out of the plurality of the devices were used in the processing of each substrate; and determining the contribution using the usage data and parameter data.

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Eindhoven, Netherlands

Hugo Thomas Looijestijn