Asml Netherlands B.v.

Hubert Matthieu Richard Steijns

Joost Jeroen Ottens

Franciscus Johannes Joseph Janssen

Frits Van Der Meulen

Marinus Aart Van Den Brink

Edwin Cornelis Kadijk

Peter Smits

Peter Paul Steijaert

Pieter Renaat Maria Hennus

Marcel Johannus Elisabeth Hubertus Muitjens

Nicolas Alban Lallemant

Johannes Paul Marie De La Rosette

Jan Liefooghe

Markus Rolf Werner Matthes

André Gillis Van De Velde

Pulkit Aggarwal

A system for measuring the difference between a property of a first target and a property of a second target, the system comprising a first member and a second member, wherein the first member comprises a first pattern, and the speed of rotation of the first member is configured to be based on the property of the first target; and the second member comprises a second pattern wherein, the speed of rotation of the second member is configured to be based on the property of the second target, further wherein the first and second pattern are angularly-varying and are configured to generate an interference pattern by their interaction when the first and second members have a relative difference in their rotational speeds, the interference pattern being indicative of the magnitude of this difference.

Differential measurement system

A lithographic apparatus comprising an illumination system configured to condition a radiation beam, a support structure constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto the substrate, the lithographic apparatus being provided with a first cooling fluid circuit which is configured to cool components to a first temperature, and provided with a second cooling fluid circuit which is configured to cool components to a second temperature that is lower than the first temperature.

Lithographic apparatus

A substrate support constructed to support a substrate for immersion lithographic processing is disclosed. The substrate support has a central part and a peripheral part positioned around the central part. The substrate support further includes a thermal decoupler arranged to decrease heat transport between the central part and the peripheral part.

Substrate support and lithographic process

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Veldhoven, Netherlands

Hubert Matthieu Richard Steijns