Asml Netherlands B.v.

Hubert Marie Segers

Johannes Onvlee

Cornelius Maria Rops

Ronald Van Der Ham

Gerben Pieterse

Jan Jaap Kuit

Jan Frederik Hoogkamp

Reinder Teun Plug

Raimond Visser

Ruud Olieslagers

Fransiscus Mathijs Jacobs

Anton Adriaan Bijnagte

Aart Adrianus Van Beuzekom

Jozef Augustinus Maria Alberti

Suzan Leonie Auer-Jongepier

Pepijn Van Den Eijnden

Francis Fahrni

Paul Van Dongen

Johannes Maquine

Rudolf M Boon

Bas Willems

Petrus Rutgerus Bartray

Paul Jacques Van Wijnen

Dirk Jan Bijvoet

Bernardus A J Luttikhuis

David Christopher Christopher Ockwell

A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.

Lithographic apparatus, method of transferring a substrate and device manufacturing method

Systems and methods for processing wafers, a combined post expose bake and chill unit, and an interface are disclosed. An exemplary system includes a lithography tool, local track, transfer device, transfer device handler, interface unit, and controller to schedule processing. An exemplary combined post expose bake and chill unit includes an enclosure having an opening in its side, and a bake unit and a chill unit in the enclosure. An exemplary interface includes a plurality of enclosures arranged around robot(s) that transfer wafers among the enclosures, one of the plurality of enclosures being an integrated bake and chill unit.

Integrated post-exposure bake track

A lithographic apparatus configured to transfer a pattern from a patterning device onto a substrate includes an integrated post-exposure bake device, the post-exposure bake device configured to subject the substrate to a predefined temperature cycle. A post-exposure bake step of the substrate (a temperature cycle) is executed within a predetermined time period after the transfer of the pattern. The lithographic apparatus may be combined with a processing system having one or more processing modules. More efficient use may be made of the combination, allowing flexibility for a device manufacturing method.

Lithographic apparatus, combination of lithographic apparatus and processing module, and device manufacturing method

The present invention provides a lithographic apparatus including an illumination system configured to condition a radiation beam; a patterning device support constructed to support a patterning device, the patterning device placed on the patterning device support being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a patterning device handling apparatus, including a single robot for exchanging a patterning device with the patterning device support and a loading station, wherein the robot includes a first holding device configured to hold a patterning device in a first holding position and a second holding device configured to hold a patterning device in a second holding position. Such single robot makes a rapid and accurate exchange of patterning devices possible.

Exchangeable object handling apparatus, lithographic apparatus including such exchangeable object handling apparatus, and device manufacturing method

The present invention relates to a lithographic apparatus including a projection system configured to project a patterned radiation beam onto a target portion of a substrate held on a substrate support, the patterned beam of radiation being patterned with a patterning device held by a patterning device support. The lithographic apparatus includes an exchangeable object handling apparatus for exchanging an exchangeable object with a exchangeable object station and a support, the exchangeable object being one of the substrate and the patterning device and the support being one of the substrate support and the patterning device support, the exchangeable object handling apparatus including an intermediate holding device for holding an exchangeable object, which intermediate holding device can interact with the support to place an exchangeable object on or take an exchangeable object from the support, and a robot which can exchange an exchangeable object with the support, the intermediate holding device and said exchangeable object station.

Lithographic apparatus and device manufacturing method

A lithographic projection apparatus includes a radiation system to supply a projection beam of radiation; a mask table provided with a mask holder to hold a mask; a substrate table provided with a substrate holder to hold a substrate; a projection system to image an irradiated portion of the mask onto a target portion of the substrate; and a preparatory station comprising an intermediate table on which a substrate can be positioned before transfer to the substrate table; the intermediate table including a major surface provided with a plurality of apertures, and gas bearing generator that generates a gas bearing between the major surface and a substrate located thereon.

Lithographic projection apparatus

A pre-aligner receives wafers from a wafer carrier or process track and performs preparatory steps such as centering of the wafer. The prepared wafer is transferred to the wafer table using a robot arm that is isolated from the pre-aligner and the wafer table. The robot arm couples to the pre-aligner to pick up the wafer, decouples, couples to the wafer table and deposits the wafer. Positional accuracy of the wafer is thereby maintained during the transfer.

Substrate handler for use in lithographic projection apparatus

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's-Hertogenbosch, Netherlands

Hubert Marie Segers