Carl Zeiss Microscopy Gmbh

Carl Zeiss Nts Gmbh

Hubert Mantz

Michael Albiez

Rainer Arnold

Jaroslaw Paluszynski

Dirk Preikszas

Michel Aliman

Ulrike Zeile

Christian Hendrich

Alexander Laue

Simon Diemer

Albrecht Glasmachers

Holger Dömer

An apparatus for focusing and for storage of ions and an apparatus for separation of a first pressure area from a second pressure area are disclosed, in particular for an analysis apparatus for ions. A particle beam device may have at least one of the abovementioned apparatuses. A container for holding ions and at least one multipole unit are provided. The multipole unit has a through-opening with a longitudinal axis as well as a multiplicity of electrodes. A first set of the electrodes is at a first radial distance from the longitudinal axis. A second set of the electrodes is in each case at a second radial distance from the longitudinal axis. The first radial distance is less than the second radial distance. Alternatively or additionally, the apparatus may have an elongated opening with a radial extent. The opening has a longitudinal extent which is greater than the radial extent.

Printed circuit board multipole for ion focusing

A method for operating a particle beam microscope comprising detecting light rays or particles which emanate from a structure, wherein the structure comprises at least one of: at least a portion of a surface of an object and at least a portion of a surface of an object holder of the particle beam microscope; generating a surface model of the structure depending on the at least one of the detected light rays and the particles; determining a position and an orientation of the surface model of the structure relative to the object region; determining a measurement location relative to the surface model of the structure; and positioning the object depending on the generated surface model of the structure, depending on the determined position and orientation of the surface model of the structure, and depending on the determined measurement location.

Particle beam microscope and method for operating the particle beam microscope

Particle beam systems and methods

A particle beam system comprises a particle beam sourcefor generating a primary particle beam, an objective lensfor focusing the primary particle beamin an object plane; a particle detector; and an X-ray detectorarranged between the objective lens and the object plane. The X-ray detector comprises plural semiconductor detectors, each having a detection surfaceoriented towards the object plane. A membrane is disposed between the object plane and the detection surface of the semiconductor detector, wherein different semiconductor detectors have different membranes located in front, the different membranes differing with respect to a secondary electron transmittance.

Particle beam system

A method of inspecting an object using a scanning particle beam microscope, the method comprising: operating the microscope in a high-resolution mode by laterally scanning a particle beam of the high-resolution mode; operating the microscope in a 3D-mode for acquiring a three-dimensional representation of the object by laterally scanning a particle beam of the 3D-mode; wherein the particle beam of the high-resolution mode and the particle beam of the 3D-mode have a same beam energy and a same focus distance; and wherein an aperture angle of the particle beam of the 3D-mode is at least 2 times greater, or at least 5 times greater, or at least 10 times greater, or at least 100 times greater than an aperture angle of the particle beam of the high-resolution mode.

Method of operating a scanning electron microscope

Growing community of inventors

Neu-Ulm, Germany

Hubert Mantz