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Micronic Laser Systems Ab

Hubert Karl Lakner

Ulric Ljungblad

Torbj&ouml;rn Sandstr&ouml;m

Peter Dürr

Peter D&uuml;rr

The present invention relates to a movable micro-element with reduced imprinting or hysteresis effect arranged spaced apart from a surface comprising at least one electrode. At least one restoring element is connected to said movable micro-element. An address electrode is arranged on said surface and capable to electrostatically attract said movable micro-element. Said address electrode is addressed to a first potential. Said movable micro-element is first set to a second potential defining a non addressed state and at a time period &#x394;t before a predetermined pulsed signal is emitted said movable micro-element is switched from said second potential to a third potential defining an addressed state. Said movable micro-element is kept in said addressed state for a time period of &#x394;t+&#x394;t'. The invention also relates to a Spatial Light Modulator (SLM), an apparatus for patterning a workpiece and a method of reducing an imprinting or hysteresis effect of a movable micro-element.

Method and a device for reducing hysteresis or imprinting in a movable micro-element

The present invention relates to an apparatus and method for patterning a work piece arranged at an image plane and sensitive to electromagnetic radiation. Said apparatus comprising a source for emitting electromagnetic radiation directed onto a selected object plane, a computer-controlled reticle comprising a plurality of object pixels, adapted to receive said electromagnetic radiation at said selected object plane and being capable of relaying said electromagnetic radiation toward said work piece arranged at said image plane, an optical projection system comprising a Fourier filter adapted to filter said relayed radiation in a Fourier space and a first lens arrangement adapted to create essentially parallel central axis of cones of radiation onto said image plane, where every cone of radiation in a specific image pixel in said image plane corresponds to a specific object pixel in said computer-controlled reticle. The invention also relates to a method for patterning a work piece sensitive to electromagnetic radiation.

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Grossroehrsdorf, Germany

Hubert Karl Lakner