United Microelectronics Corp.

Huan-Hsin Yeh

Chung-An Chen

Hua-Wei Peng

Hsin-Hsu Lin

Kuo-Tsai Lo

Chao-Chi Lu

Ming-Che Lai

Kao-Hua Wu

Chia-He Cheng

Wen-Kuang Lin

Ming-Tso Chen

A substrate processing apparatus includes a process station for processing a substrate; a cassette station integrated with the process station; a substrate carriage equipped for transferring the substrate between said process station and the cassette station through a passage located at an interface between the process station and said cassette station; and a substrate scanner equipped at said interface between the process station and the cassette station for capturing surface image data during transportation of the substrate that passes through the passage.

Substrate processing apparatus equipped with substrate scanner

A method for forming an anti-reflection coating (ARC) with no hole over an overlay mark is described, which applies a fluid material of the ARC onto a substrate and then conducts at least two curing steps to convert the fluid material into the ARC. Such a bottom anti-reflection coating with no hole over the overlay mark can improve accuracy of the overlay measurement of lithography, thereby improving the alignment accuracy of the lithography process.

Process for forming anti-reflection coating and method for improving accuracy of overlay measurement and alignment

Growing community of inventors

Cyonglin, Taiwan

Huan-Hsin Yeh