Taiwan Semiconductor Manufacturing Comp. Ltd.

TSMC Nanjing Company, Limited

TSMC China Company Limited

Huaixin Xian

Qingchao Meng

Jerry Chang Jui Kao

Liu Han

Jing Ding

Zhang-Ying Yan

Yang Zhou

Shang-Chih Hsieh

Xiangdong Chen

Changlin Huang

Xin Yong Wang

Hui-Zhong Zhuang

Lei Pan

Yung-Chen Chien

Tzu-Ying Lin

Kai Zhou

Xing Chao Yin

JiBao Zhang

Longbiao Lei

J B Zhang

Sinpei Goa

A semiconductor device includes: a cell region including active regions that extend in a first direction and have components of corresponding transistors formed therein; a first majority of the active regions being rectangular; a first one of the active regions having a T-shape including a stem that extends in a second direction perpendicular to the first direction, and, relative to the first direction, first and second arms that extend from a same end of the stem and away from each other; and, relative to the first direction, a second majority of the active regions having aligned first ends defining a first reference line proximate and parallel to a first boundary of the cell region, and a third majority of the active regions having aligned second ends defining a second reference line proximate and parallel to a second boundary of the cell region.

Semiconductor device with T-shaped active region and methods of forming same

A semiconductor device having a cell region, the cell region including a first set of one or more first blocks and a second set of one or more second blocks. Each of the first blocks including a clock gate and each of the second blocks includes a decoupling capacitor. The first set has two or more first blocks and/or the second set has two or more second blocks. The first blocks of the first set are interleaved with the second blocks of the second set.

Semiconductor device having interleaved clock gate blocks and decoupling capacitor blocks and method of operating same

A current-distributing structure in an integrated circuit (IC) includes a substrate; and first and second active regions on the substrate. First and second sets of gate structures correspondingly overlap the first and second active regions. A first conductive structure in a first metallization layer overlaps the first active region and is electrically coupled to the first set of gate structures. A second conductive structure in the first metallization layer overlaps the second active region and is electrically coupled to the second set of gate structures. A third conductive structure in a second metallization layer is electrically coupled to the first and the second conductive structures.

Current-distributing pin structure and method of forming same

An integrated circuit includes a first time delay circuit, a second time delay circuit, and a master-slave flip-flop having a gated input circuit and a transmission gate. The transmission gate is configured to receive the first clock signal and the second clock signal to control a transmission state of the transmission gate. The gated input circuit is configured to have an input transmission state controlled by the third clock signal at the second output of the second time delay circuit. The second time delay circuit further includes a second gate-conductor and a second gate via-connector in direct contact with the second gate-conductor. The second gate-conductor intersects a first-type active region structure and a second-type active region structure in a second area, and wherein at least a portion of the second gate via-connector is atop the second-type active region structure.

Method for forming a timing circuit arrangements for flip-flops

A semiconductor device includes a first conductivity-type substrate, and a cell region including: a second conductivity type deep well; first and second non-deep wells having the second conductivity-type, the first and second non-deep wells being in corresponding first and second portions of the substrate, the first and second portions of the substrate being in the deep well; and first, second, third and fourth transistor-regions. The first and second transistor-regions are correspondingly in the first and second non-deep wells and include first conductivity-type first transistors. The third and fourth transistor-regions are in the third and fourth portions of the substrate which are in the deep well, and include second transistors having the second conductivity-type. The first transistor-region is configured for a first power domain. The second, third and fourth transistor-regions are configured for a second power domain that is different than the first power domain.

Semiconductor device with common deep N-well for different voltage domains and method of forming same

An integrated circuit (IC) device includes at least one circuit having an input and an output, and an output connector electrically coupled to the output. The circuit further includes a plurality of transistors electrically coupled with each other between the input and the output. The output is in a first metal layer. The output connector includes a first conductive pattern in the first metal layer, and a second conductive pattern in a second metal layer different from the first metal layer. The second conductive pattern electrically couples the output to the first conductive pattern.

Integrated circuit device

An integrated circuit includes a clocking transistor, a first enabling transistor, a second enabling transistor, a branch-one transistor, and a branch-two transistor. The first enabling transistor is coupled between the clocking transistor and a first node. The second enabling transistor is coupled between the clocking transistor and a second node. The branch-one transistor is coupled between a first power supply and the first node. The gate terminal of the branch-one transistor is connected to the second node. The branch-two transistor is coupled between the first power supply and the second node. The gate terminal of the branch-two transistor is connected to the first node. Each of the clocking transistor, the first enabling transistor, and the second enabling transistor is a first-type transistor of a reduced threshold. Each of the branch-one transistor and the branch-two transistor is a second-type transistor of a default threshold.

Method of and apparatus for controlling clock signal

A semiconductor device includes: a cell region including active regions where components of transistors are formed; the cell region are arranged to function as a D flip-flop that includes a primary latch (having a first sleepy inverter and a first non-sleepy (NS) inverter), a secondary latch (having a second sleepy inverter and a second NS inverter), and a clock buffer (having third and fourth NS inverters). The transistors are grouped: a first group has a standard threshold voltage (Vt_std); a second group has a low threshold voltage (Vt_low); and an optional third group has a high threshold voltage (Vt_high). The transistors which comprise the first or second NS inverter have Vt_low. Alternatively, the transistors of the cell region are further arranged to function as a scan-insertion type of D flip-flop (SDFQ) that further includes a multiplexer; and the transistors of the multiplexer have Vt_low.

Flip-flop with transistors having different threshold voltages, semiconductor device including same and methods of manufacturing same

A scan flip-flop circuit includes a selection circuit including first and second input terminals coupled to first and second I/O nodes, a flip-flop circuit coupled to the selection circuit, a first driver coupled between the flip-flop circuit and the first I/O node, and a second driver coupled between the flip-flop circuit and the second I/O node. The selection circuit and drivers receive a scan direction signal. In response to a first logic level of the scan direction signal, the selection circuit responds to a first signal received at the first input terminal, and the second driver outputs a second signal responsive to a flip-flop circuit output signal. In response to a second logic level of the scan direction signal, the selection circuit responds to a third signal received at the second input terminal, and the first driver outputs a fourth signal responsive to the flip-flop circuit output signal.

Bi-directional scan flip-flop circuit and method

A semiconductor device has a cell region including active regions that extend in a first direction and in which are formed components of transistors. The transistors of the cell region are arranged to function as a scan insertion D flip flop (SDFQ). The SDFQ includes a multiplexer serially connected at an internal node to a D flip-flop (FF). The transistors of the multiplexer include data transistors for selecting a data input signal, the data transistors having a first channel configuration with a first channel size, and scan transistors of the multiplexer for selecting a scan input signal, the scan transistors having a second channel configuration with a second channel size. The second channel size is smaller than the first channel size.

Multiplexer for SDFQ having differently-sized scan and data transistors, semiconductor device including same and methods of manufacturing same

A semiconductor device includes a first dummy group having a first set of dummy transistors; a first delay cell having a first set of active transistors; a second delay cell having a second set of active transistors; a second dummy group having a second set of dummy transistors; and relative to a first direction the first and second dummy groups and the first and second delay cells being arranged in a first sequence arranged as the first dummy group, the first delay cell, the second delay cell, and the second dummy group; and the first and second delay cells being free from having another dummy group therebetween.

Semiconductor device with daisy-chained delay cells and method of forming same

A method of forming a semiconductor device includes forming active regions, forming S/D regions, forming MD contact structures and forming gate lines resulting in corresponding transistors that define a first time delay circuit having a first input configured to receive a first clock signal and having a first output configured to generate a second clock signal from the first clock signal; and corresponding transistors that define a second time delay circuit having a second input configured to receive the second clock signal and having a second output configured to generate a third clock signal from the first clock signal; forming a first gate via-connector in direct contact with the first gate line atop the first-type active region in the first area; and forming a second gate via-connector in direct contact with the second gate line atop the second-type active region in the second area.

An integrated circuit (IC) device includes at least one delay circuit having an input and an output, and an output connector electrically coupled to the output. The delay circuit further includes a plurality of transistors electrically coupled with each other between the input and the output. The plurality of transistors is configured to delay an input signal received at the input to generate a delayed signal at the output. The output is in a first metal layer. The output connector includes a first conductive pattern in the first metal layer, and a second conductive pattern in a second metal layer different from the first metal layer. The second conductive pattern electrically couples the output to the first conductive pattern.

An integrated circuit includes a clocking transistor, a first enabling transistor, a second enabling transistor, a branch-one transistor, a branch-two transistor, and a clock gating circuit. The first enabling transistor is coupled between the clocking transistor and a first node. The second enabling transistor is coupled between the clocking transistor and a second node. The branch-one transistor is coupled between a first power supply and the first node. The gate terminal of the branch-one transistor is electrically connected to the second node. The branch-two transistor is coupled between the first power supply and the second node. The gate terminal of the branch-two transistor is electrically connected to the first node. The clock gating circuit for generating a gated clock signal receives a latch output signal which is latched to a logic level of either a first node signal or a second node signal.

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Hsinchu, Taiwan

Huaixin Xian