Asml Netherlands B.v.

Hua Li

Nicolaas Rudolf Kemper

Marinus Jochemsen

Cédric Désiré Grouwstra

Norbertus Josephus Martinus Van Den Nieuwelaar

Dirk De Vries

Johannes Catharinus Hubertus Mulkens

Martinus Hendrikus Antonius Leenders

Michel Riepen

Marco Koert Stavenga

Sergei Shulepov

Erik Henricus Egidius Catharina Eummelen

Paulus Martinus Maria Liebregts

Koen Steffens

David Bessems

Richard Moerman

Fabrizio Evangelista

Gert-Jan Gerardus Johannes Thomas Brands

Pieter Lein Joseph Gunter

Jan Willem Cromwijk

Jacob Fredrik Friso Klinkhamer

Erik Witberg

Ralph Joseph Meijers

Jia Wang

Franciscus Wilhelmus Bell

Marcus Agnes Johannes Smits

Zhenhua Ma

Jigang Ma

A method of configuring a mark having a trench to be etched into a substrate, the method including: obtaining a relation between an extent of height variation across a surface of a probationary layer deposited on a probationary trench of a probationary depth and a thickness of the probationary layer; determining an extent of height variation across the surface of a layer deposited on the mark allowing a metrology system to determine a position of the mark; and configuring the mark by determining a depth of the trench based on the relation, the extent of height variation and the thickness of a process layer to be deposited on the mark.

Method of designing an alignment mark

Disclosed is a bandwidth calculation system for determining a desired wavelength bandwidth for a measurement beam in a mark detection system, the bandwidth calculation system comprising a processing unit configured to determine the desired wavelength bandwidth based on mark geometry information, e.g. comprising mark depth information representing a depth of a mark. In an embodiment the desired wavelength bandwidth is based on a period and/or a variance parameter of a mark detection error function. The invention further relates to a mark detection system, a position measurement system and a lithographic apparatus comprising the bandwidth calculation system, as well as a method for determining a desired wavelength bandwidth.

Bandwidth calculation system and method for determining a desired wavelength bandwidth for a measurement beam in a mark detection system

A method of adjusting speed and/or routing of a part of a movement plan of a table under an immersion fluid supply system of a lithographic apparatus. The method includes splitting the movement plan of the table into a plurality of discrete movements; determining a risk of a bubble of a size greater than a certain size being present in immersion fluid through which a patterned beam of the lithographic apparatus will pass during a certain discrete movement by determining whether the immersion fluid supply system passes over a position at which immersion fluid leaked from the immersion fluid supply system is present; and adjusting the speed and/or routing of a part of the movement plan corresponding to (i) a discrete movement earlier than a discrete movement for which the risk of a bubble is determined, and/or (ii) a discrete movement for which the risk of a bubble is determined.

Method of adjusting speed and/or routing of a table movement plan and a lithographic apparatus

A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.

Lithographic apparatus, a method of controlling the apparatus and a device manufacturing method

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Eindhoven, Netherlands

Hua Li