Industrial Technology Research Institute

Other

Sumitomo Chemical Company, Limited

Au Optronics Corporation

Chunghwa Picture Tubes, Ltd.

Hannstar Display Corporation

Chi Mei Optoelectronics Corporation

Toppoly Optoelectronics Corporation

Quanta Display Inc.

Taiwan Tft Lcd Association

Hua-Chi Cheng

Cheng-Chung Lee

Yu-Yang Chang

Pao-Ju Hsieh

Jyh-Rong Sheu

Jane-Hway Liao

Wen-Chun Wang

Jia-Chong Ho

Chun-Hsiang Wen

Jun-Ichi Yasukawa

Yaw-Ting Wu

Hajime Kuwahara

Shu-Huei Cheng

Ming-Nan Hsiao

Jing-Yi Yan

Hsien-Kuang Lin

Chao-Jen Wang

Chen-Wei Lin

Yen-Shih Huang

Dhei-Jhai Lin

Ching-Hsun Chao

Chao-Wen Niu

Rong-Jer Lee

Bor-Chuan Chuang

Ming-Hsiang Chan

Chun-Yao Ou

Kuang-Chung Chen

Ming-Shiang Jan

Chao H Tseng

Wen-Tung Cheng

A pixel structure and a pixel circuit having multi-display mediums are provided. A storage capacitor and a first display medium are disposed in different layers, so as to overlap the storage capacitor with a pixel electrode of the first display medium. Accordingly, an area of the first display medium can be increased for enlarging an aperture ratio of the pixel. Furthermore, because a third pixel electrode is disposed in a conductive layer, the third pixel electrode can control/drive a second display medium under a substrate.

Pixel structure and pixel circuit having multi-display mediums

A method of fabricating an active layer thin film by a metal-chalcogenide precursor solution is provided, including the steps of: synthesizing a metal-chalcogenide precursor containing benzyl or benzyl derivative; dissolving the precursor in a solvent to produce a precursor solution, wherein a chalcogen element or compound can be added to the precursor solution to adjust the molar ratio of metal ion to chalcogen; and then applying the precursor solution onto a substrate in a specific coating manner, to form a film of the metal-chalcogenide after a curing process. Thereby, the existing method wherein an amorphous silicon active layer film is fabricated by plasma enhanced chemical vapor deposition (PECVD) is replaced.

Method of fabricating active layer thin film by metal chalcogenide precursor solution

A method for manufacturing TFTs is provided. It can be applied to both inverted staggered and co-planar TFT structures. The manufacturing method for the staggered TFT includes the formation of a gate electrode, a gate insulator, an active channel layer, a drain electrode, and a source electrode on a substrate. It emphasizes the use of metal oxides or II-VI compound semiconductors and low-temperature CBD process to form the active channel layer. In a CBD process, the active channel layers are selectively deposited on the substrates immersed in the solution through controlling solution temperature and PH value. The invention offers the advantages of low deposition temperature, selective deposition, no practical limit of panel size, and low fabrication cost. Its low deposition temperature allows the use of flexible substrates, such as plastic substrates.

Methods for manufacturing thin film transistors that include selectively forming an active channel layer from a solution

A method for fabricating the cathode plate of a carbon nano tube field emission display uses a photosensitive paste and etchable dielectric material to fabricate the cathode plate. The method combines photolithography process and etching process to fabricate a cathode electrode layer, a dielectric layer, a gate layer, and a carbon nano tube emission layer. Packing this cathode plate structure with a conventional anode plate together can form a carbon nano tube field emission array. The distribution of the electric field is uniform and the alignment at post-process is made easy.

Cathode plate of a carbon nano tube field emission display and its fabrication method

A triode structure of a field emission display is manufactured with thick-film technology. The triode structure includes a cathode electrode layer that comprises a metallic catalyst. Isomeric carbon emitters can be grown on the cathode electrode layer by CVD process at a low temperature because of the metallic catalyst. Instead of mixing the metallic catalyst in the cathode electrode layer, a metallic catalyst layer can be formed on the cathode electrode layer to facilitate the growth of the isomeric carbon emitters. The combination of thick film technology and low temperature CVD process provide a low cost method for fabricating a large area field emission display with isomeric carbon emitters.

Method of growing isomeric carbon emitters onto triode structure of field emission display

A field emission display panel device that incorporates carbon nanotube emitter layers for emitting electrons wherein the carbon nanotube layers has a smaller width than the conductive paste layers it is deposited on is disclosed. The width of the carbon nanotube layer should be less than &frac34; of the width of the conductive paste layer, or in a range between about &frac14; and &frac34; of the width of the conductive paste layer, i.e. such as a silver paste layer. The present invention novel structure prevents the overflow of the carbon nanotubes, after a curing process for the nanotubes is conducted, onto the sidewall of the conductive paste layer, and thus significantly improves the electron density projected toward the flourescent powder coating layer to produce an image with reduced electron scattering. As a result, image clarity, definition and contrast can be improved in the FED device.

Field emission display panels incorporating cathodes having narrow nanotube emitters formed on dielectric layers

A manufacturing method for an electron-emitting source of triode structure, including forming a cathode layer on a substrate, forming a dielectric layer on the cathode layer, and positioning an opening in the dielectric layer to expose the cathode layer, wherein the opening has a surrounding region, forming a gate layer on the dielectric layer, except on the surrounding region, forming a hydrophilic layer in the opening, forming a hydrophobic layer on the gate layer and the surrounding region, wherein the hydrophobic layer contacts the ends of the hydrophilic layer, dispersing a carbon nanotube solution on the hydrophilic layer using ink jet printing, executing a thermal process step, and removing the hydrophobic layer. According to this method, carbon nanotubes are deposited over a large area in the gate hole.

Manufacturing method for an electron-emitting source of triode structure

A field emission display panel of the diode structure that has a dual-layer cathode and an anode formed on a bottom glass panel and a method for such fabrication are described. In the FED panel, a plurality of emitter stacks is formed each having a layer of dielectric material, a first layer of a conductive paste coated with a layer of nanotube emitters on a peripheral, sidewall surface as a cathode, and a second layer of the conductive paste deposited on top of the nanotube emitter layer. The first layer and the second layer are formed in a column shape. The second conductive paste layer stops any nanotubes left on a top surface of the first conductive paste layer from emitting electrons in an upward direction and restricts all emitted electrons in a downward direction.

Field emission display panel equipped with a dual-layer cathode and an anode on the same substrate and method for fabrication

The invention discloses a liquid crystal panel which is characterized in that each color filter is compartmentalized by the black matrix and the spacers are positioned on the region confined by the black matrix and the spacer bottom connects the first conductive film. The invention also discloses a process for producing liquid crystal panel, which is characterized in that the color filters and spacers are produced by coating a four-level photoresist and by a first exposure step which is masked by a four-level photoresist; the red region, green region and blue region are produced by development and electro-deposition; and the spacers are produced by a second exposure step which is masked by a spacer reticle, a development step which emerges the first conductive film within a region confined by the black matrix, and a step of electrodeposition coating compositions on the emerged region of the first conductive film. The spacers position and sizes could be easily determined by spacer reticle and high quality display performances could be achieved.

Liquid crystal panel and method for producing the same

The invention relates to a method for manufacturing color filters utilizing a color electrodeposition coating which contains an anionic electrodeposition resin having a low acid value. Said method comprises coating a layer of positive photoresist onto a transparent electrically conductive substrate, exposing the substrate under a photomask or photomasks to form regions of different initial levels of exposure energy, exposing the entire surface of the substrate through an energy-incrementing way to, progressively, allow all regions of the substrate to achieve an energy sufficient to completely expose the photoresist on each corresponding region, developing stepwise each region with a same developer solution to cause the electrically conductive substrate of the corresponding region uncovered, electrodepositing said region with a color electrodeposition coating containing an anionic electrodeposition resin having a low acid value to finish the pixel arrangements of the desired colors and completely exposing the substrate. The low acid value anionic electrodeposition resin utilized in the invention has an acid value of 1 to 70 mg KOH/g. The method of the invention shows the advantages of having a high degree of freedom in pattern figures and a wide process window. Moreover, the manufacture color filters of large surface and the perfect yield rate of products are possible.

Methods for manufacturing color filters

An improved method for preparing multiple-exposure photomasks having at least three levels of transmissivity is disclosed. A conventional bi-exposure photomask is first formed which contains a macroscopically exposed area, a microscopically exposed area, and a masked area on a transparent substrate. Then a diffractive-refractive light-scattering optical element is formed above the microscopically exposed area so as to provide an exposure area with an intermediate light transmissivity. In a preferred embodiment, the diffractive-refractive light-scattering optical element above the microscopically exposed area is formed by first forming a transparent positive photoresist above the bi-exposure photomask. The transparent positive photoresist is exposed to an irradiation from the bottom of the transparent substrate, and is developed. Finally, the transparent positive photoresist is heated to cause a melt-flow thereof which forms a concave optical element above the microscopically exposed area. The transmissivity of the intermediate exposure area can be adjusted by adjusting the dimensions of the microscopical openings provided therein and the distance between the microscopic openings. More than one microscopic pattern can be provided on the same substrate so as to allow two or more intermediate transmissitivities to be obtained.

Method for making photomasks having regions of different light

A positive photoresist composition is disclosed which comprises a photosensitive compound, a phenolic resin, and an organic solvent. The phenolic resin is prepared from a monomeric composition comprises formaldehyde and a mixture of phenol monomers. The mixture of phenol monomers comprises: (a) no more than 98 mole percent of a mixture of monohydroxy phenols, the mixture of monohydroxy phenols comprises: (I) about 50.about.80 mole percent of meta-methylphenol; (ii) about 10.about.30 mole percent of 2,5-dimethylphenol; and (iii) about 10.about.40 mole percent of 2,3,5-trimethylphenol; and (b) at least 2 mol percent of at least one polyhydroxybenzene which is presented by the following formula: ##STR1## wherein n is an integer of 1 or 2. Preferably, the polyhydroxybenzene is a mixture of trihydroxybenzene and dihydroxybenzene in a molar ratio of about 40 to 60. The photoresist composition can be developed using a weak basic solution which causes images of sharp contrast to be developed; it can also be advantageously used in making color filters for use in color liquid crystal displays in a multiple development process in conjunction with an electrodeposition lithography.

Weak base developable positive photoresist composition containing

An improved method is disclosed for making color filters via electrodeposition or lithographic electrodeposition of a plurality of colored resins onto an electrically conductive substrate. The method comprises the steps of: (a) forming a black-hued pattern on the substrate; (b) dividing the substrate into an intended zone and a conjugate zone, the intended zone being portions of the substrate to be deposited with the colored resins and the conjugate zone being portions of the substrate not to be deposited with the colored resins; (c) forming a permanent insulation film on the conjugate zone of the substrate; and (d) electrodepositing the colored resins onto the intended zone of the substrate. The photosensitive insulation resin is preferably a negative photosensitive resin containing: (i) a resin binder containing a carboxyl (COOH) group; (ii) 1-15 wt %, based on the weight of the resin binder, of a photopolymerization initiator; and (iii) 30-100 wt %, based on the weight of the resin binder, of a photo-reactive monomer or oligomer each containing at least two unsaturated double bonds.

Method for producing color filters

Growing community of inventors

Cyonglin, Taiwan

Hua-Chi Cheng