Taiwan Semiconductor Manufacturing Comp. Ltd.

Hsueh-Hung Wu

Li-Jui Chen

Fu-Jye Liang

Disclosed is a lithography system. The lithography system includes a lithography exposure tool designed for performing an exposure process to a radiation-sensitive material layer coated on an integrated circuit substrate; an alignment module coupled with the lithography exposure tool, designed for alignment measurement, and configured for transferring the integrated circuit substrate to the lithography exposure tool; and an alignment calibration module designed to calibrate the alignment module relative to the lithography exposure.

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Hsinchu, Taiwan

Hsueh-Hung Wu