Taiwan Semiconductor Manufacturing Comp. Ltd.

Hsu-Yuan Liu

Cheng-Han Wu

Heng-Jen Lee

Shih-Che Wang

Ho-Yung David Hwang

Wen-Zhan Zhou

Yu-Chen Huang

A method of supplying a chemical solution to a photolithography system. The chemical solution is pumped from a variable-volume buffer tank. The pumped chemical solution is dispensed in a spin-coater. The variable-volume buffer tank is refilled by emptying a storage container filled with the chemical solution into the variable-volume buffer tank.

System and method for supplying and dispensing bubble-free photolithography chemical solutions

A photolithography system includes a variable-volume buffer tank, a dispensing system connected to the buffer tank, and a valve configured to release gas from a head space of the buffer tank while blocking the release of liquid from the head space. A storage container has an opening at the bottom and drains to the buffer tank through that opening. The buffer tank has a storage capacity sufficient to receive the full contents of the storage container. The system supplies chemical solutions to the dispensing system while keeping the chemical solutions from contact with air and other gases.

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Zhudong, Taiwan

Hsu-Yuan Liu