Intel Corporation

Hsu-en Yang

Everett B Lee

Jeff Junhao Xu

Michael Ru

Chung Hui

Qiquan Geng

First radicals and second radicals are simultaneous deposited into a space defined by two adjacent lines of photoresists and an underlying layer. A portion of the first radicals and the second radicals combine to form a polymer layer on the layer in the center of the space, and substantially simultaneously, another portion of thee first radicals remove the underlying layer near the base of the photoresists. The first radicals may be fluorine-rich and the second radicals may be carbon-rich.

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San Jose, CA, United States of America

Hsu-en Yang