Taiwan Semiconductor Manufacturing Comp. Ltd.

Hsing-Wang Chen

Ching-Juinn Huang

Chih-Chun Hsu

Yu-Ching Wang

Chuan-Fang Su

Yen-Shen Chen

Ting-Yu Yen

Chun-Shiang Chang

Rung-Shiang Chen

Chan-Kang Kuo

Some embodiments of the present disclosure provide an integrated circuit (IC) design method. The method includes (1) receiving a first layout comprising stripe patterns with a first separation and a first width; (2) receiving a second layout comprising stripe patterns with a second width narrower than the first separation, each stripe on the second layout is configured to situate between two adjacent stripes on the first layout when overlaying the first layout and the second layout; (3) performing a separation check by identifying a spacing between a stripe on the second layout and one of the two adjacent stripes on the first layout; and (4) adjusting the spacing between the stripe on the second layout and one of the two adjacent stripes on the first layout when the separation check determining the spacing is greater than a predetermined value.

Method and apparatus for optical proximity correction

A semiconductor circuit pattern includes an angled conductive pattern having a line portion and a pad portion at an end of the line portion extending normal to the line portion on a first side of the line portion. The pad portion has a width greater than a width of the line portion. A spacing has a first portion adjacent the first side of the pad portion, and a second portion adjacent a second side of the pad portion opposite the first side. The first portion of the spacing has a width greater than the width of the second portion of the spacing.

Semiconductor device and method for making same

Growing community of inventors

Tainan, Taiwan

Hsing-Wang Chen