Taiwan Semiconductor Manufacturing Comp. Ltd.

Hsing-Chieh Lee

Hung-Jui Kuo

Ming-Tan Lee

A single layer process is utilized to reduce swing effect interference and reflection during imaging of a photoresist. An anti-reflective additive is added to a photoresist, wherein the anti-reflective additive has a dye portion and a reactive portion. Upon dispensing the reactive portion will react with underlying structures to form an anti-reflective coating between the underlying structure and a remainder of the photoresist. During imaging, the anti-reflective coating will either absorb the energy, preventing it from being reflected, or else modify the optical path of reflection, thereby helping to reduce interference caused by the reflected energy.

Semiconductor devices and methods of manufacturing

A photoresist with a detection additive is utilized to help increase the contrast of images during an after development inspection process. The detection additive fluoresces during the after development inspection process and adds to the energy that is reflected during the after development inspection process, increasing the contrast during the after development inspection process and helping to identify defects that are not otherwise detectable.

Growing community of inventors

Hsinchu, Taiwan

Hsing-Chieh Lee