Taiwan Semiconductor Manufacturing Comp. Ltd.

Geosat Aerospace & Technology

Other

Hsin-Yuan Chen

Yi-Bin Lin

Yi-Chiang Yang

Wei-Hao Wang

Chien-Hung Liu

Kun-Pi Cheng

Yo-Nien Lin

Cheng-Ming Wu

Po-Tao Chu

Chung-Jen Chen

Tai-Ming Yang

Hsing-Fu Lee

Jin-Jie Yang

Shoue-Ann Yang

Kuan-Luan Cheng

Chi-Chung Hsu

Chih-Fu Li

Feng-Cheng Chung

An unmanned ground vehicle (UGV) includes one or more motors configured to drive one or more wheels of the UGV, an obstacle sensor, a memory storing instructions, and a processor coupled to the one or more motors, the obstacle sensor, and the memory. The processor is configured to execute the instructions to cause the UGV to obtain location information of multiple navigation points; calculate a navigation path based on the obtained location information; drive the one or more motors to navigate the UGV along the navigation path; detect, by the obstacle sensor, whether one or more obstacles exist while navigating the UGV, and if detected, determine location information of the one or more obstacles; and if the one or more obstacles are detected by the obstacle sensor, update the navigation path based on determined location information of the one or more obstacles.

Unmanned ground vehicle and method for operating unmanned ground vehicle

An unmanned ground vehicle (UGV) includes one or more motors configured to drive one or more wheels of the UGV, a memory storing instructions, and a processor coupled to the one or more motors and the memory. The processor is configured to execute the instructions to cause the UGV to determine location information of a movable target; calculate a direction and a speed for the unmanned ground vehicle based on the determined location information; and drive the one or more motors to move the unmanned ground vehicle in the calculated direction at the calculated speed to follow the movable target when the movable target moves.

A photomask storage apparatus including a bottom plate and top lid is provided. The photomask storage apparatus includes poly-ether ketone (PEEK). A fastening element is configured to couple the lid to the bottom plate. A retaining element is secured to the lid to prevent vibrations of a photomask. A vent structure is also provided. The vent structure is configured such that airflow through the vent is purged in approximately 360 degrees into a chamber including the photomask. The vent structure may include a particulate filter. A seal liner is disposed on the bottom component.

Photomask storage apparatus

A method for capturing real-time video and audio data at a specific location is provided. A real-time video and audio data of people, objects and landscapes at a specific location may be obtained at any time and place. A user needing real-time video and audio data of objects, people and landscapes at a specific location access a specific website and then inputs his/her requests. By the website, these requests are transmitted to a mainframe platform of the telecommunication companies which have signed an agreement with a company of the website and telecommunication companies select and match video mobile phone users for providing the services to users.

Method for capturing real-time video and audio data at specific location

An automatic method to maintain and correct overlay in the fabrication of integrated circuits is described. An overlay control table is automatically generated for lots run through a process tool. An overlay correction is calculated from the overlay control table and sent to the process tool for real-time or manual overlay correction.

Smart overlay control

A method for fabricating a microelectronic product and a system for fabricating the microelectronic product each employ an in-line automatic photolithographic processing and overlay registration measurement for a pair of pilot lots of a new product order, prior to in-line automatic processing of an additional new product order lot within a photolithographic process tool. The method and the system provide for efficient production of new product order lots, absent need for an independent pilot lot qualification method or system.

Overlay registration control system and method employing multiple pilot lot in-line overlay registration measurement

Removing photoresist from alignment marks on a semiconductor wafer using a wafer edge exposure process is disclosed. The alignment marks on the wafer are covered by photoresist used in conjunction with semiconductor processing of one or more layers deposited on the semiconductor wafer. One or more parts of the edge of the wafer are exposed to remove the photoresist from these parts and thus reveal alignment marks on the wafer. The exposure of the one or more parts of the wafer is accomplished without performing a photolithographic clear out process. Rather, a wafer edge exposure (WEE) process is inventively utilized. Once the WEE process is performed, subsequent layers may be deposited by aligning them using the revealed alignment marks.

Growing community of inventors

Tainan, Taiwan

Hsin-Yuan Chen