Taiwan Semiconductor Manufacturing Comp. Ltd.

Hsin-Yi Yin

Chih-Ming Chen

Cheng-Ming Lin

Hao-Ming Chang

Cheng-Hsuen Chiang

Hsao Shih

Huai-Chih Cheng

A method of manufacturing a photomask includes at least the following steps. First, a phase shift layer and a hard mask layer are formed on a light transmitting substrate. A predetermined mask pattern is split into a first pattern and a second pattern. A series of processes is performed so that the hard mask layer and the phase shift layer have the first pattern and the second pattern. The series of processes includes at least the following steps. First, a first exposure process for transferring the first pattern is performed. Thereafter, a second exposure process for transferring the second pattern is performed. The first exposure process and the second exposure process are executed by different machines.

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Taoyuan, Taiwan

Hsin-Yi Yin