San Fang Chemical Industry Company, Ltd.

Hsin-Ru Song

Chung-Chih Feng

I-Peng Yao

Lyang-Gung Wang

Wen-Chieh Wu

Chun-Ta Wang

The present invention relates to a polishing pad and a method for making the same. The polishing pad includes a polymeric elastomer and a plurality of hollow structures. The hollow structures are distributed in the polymeric elastomer uniformly, and the sizes of the hollow structures are substantially equal to each other.

Polishing pad and method for making the same

The present invention relates to a sheet for mounting a workpiece and a method for making the same. The method includes the steps of: (a) providing a sheet body having a top surface, a bottom surface, at least one side surface and a plurality of pores, wherein some of the pores open at the side surface; and (b) sealing or narrowing the pores that open at the side surface. Since the pores that open at the side surface are sealed or narrowed, the slurry is prevented from entering into the interior of the sheet body. Therefore, the infiltration distance reaches a predetermined value slowly, thereby increasing the effective life of the sheet.

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Kaohsiung, Taiwan

Hsin-Ru Song