United Microelectronics Corp.

Hsin-Hsu Lin

Chi-Hung Wei

Hua-Wei Peng

Lien-Sheng Chung

Huan-Hsin Yeh

Chao-Chi Lu

Kuo-Tsai Lo

Ming-Che Lai

Kao-Hua Wu

Chia-He Cheng

Ming-Tso Chen

A substrate processing apparatus includes a process station for processing a substrate; a cassette station integrated with the process station; a substrate carriage equipped for transferring the substrate between said process station and the cassette station through a passage located at an interface between the process station and said cassette station; and a substrate scanner equipped at said interface between the process station and the cassette station for capturing surface image data during transportation of the substrate that passes through the passage.

Substrate processing apparatus equipped with substrate scanner

A method of removing photoresist is provided. In the whole process of removing the photoresist, plasma is not used. Instead, a first solution is used in a first removal step to remove a photoresist layer. Then, a second solution is used in a second removal step to completely remove the photoresist layer. The first solution and the second solution have different polarities, and the polarity of the first solution is large than that of the second solution.

Method of removing photoresist and photoresist rework method

Growing community of inventors

Taipei County, Taiwan

Hsin-Hsu Lin