United Microelectronics Corp.

Hsien-Jung Hsu

Hung-Lung Ma

Kuo-Chen Wang

Kuo-Feng Huang

Kuei-Hsi Lai

Ming-Che Yang

Ching-Chih Cheng

Shih-Hsun Chiu

Hsi-Huang Lee

Cha-Ming Kuo

A spray nozzle resetting device comprises a spray nozzle for spraying resist onto a midpoint of a wafer, a rotary robotic arm that has a resist-delivering duct connected to the spray nozzle, a covering nut, a resetting ring, and a fixing ring. The covering nut has an opening of diameter D. The resetting ring has a rotary part of a diameter less than or equal to D, which fits in the opening of the covering nut, and at least two protrusions. The fixing ring, having two recesses that correspond to the two protrusions and interact with them, is used to connect the covering nut and the rotary robotic arm.

Nozzle reposition device used in a resist coating process

A spray coating device for coating a rotating wafer according to the invention is disclosed. The spray coating device comprises a spray head having a plurality of spray holes which are located on one end thereof with more in number on both sides than on the center of the end for uniformly spraying a chemical liquid on the rotated wafer. Since spray holes are more in number on the both sides than on the center of the end, the rotated wafer can be uniformly spray coated with the chemical liquid even though several spray holes are congested.

Spray coating device

A cup rinse with a valvular ring according to the invention is disclosed. The valvular ring has a plurality of valves in the center thereof. When an inlet tube is inserted through the valvular ring, the valves are forced to open thereby to allow a chemical liquid to flow into the cup resin via the inlet tube. Inversely when the inlet tube is completely pulled out of the valvular ring, the valves are tightly closed without a chemical liquid leakage. Accordingly, the cup rinse of the invention can prevent peripheral precision instruments, such as a motor, from damage by a leaky chemical liquid. Thus, the cup rinse of the invention cannot cause any unnecessary cost consumption.

Cup rinse with a valvular ring

A speed controller with scales according to the invention is used to adjust the amount of an air flow thereby to control the amount of a chemical liquid sprayed. The speed controller includes a housing, a controller body and a transparent tube. The controller body is partly inserted in the housing and has a rotary button located at one end thereof and outside the housing. The rotary button has a slot and an indicator thereon, wherein the indicator is located at one end of the slot. The transparent tube, having a vertical scale on the side thereof and a circular scale on the top circumference thereof, encloses the rotary button. In the invention, the position of the rotary button can be determined by reading the vertical scale and the circular scale so as to precisely control the amount of a chemical liquid sprayed, thereby increasing yield and improving engineering analysis.

Speed controller with scales

A photoresist dispensing system used in a photoresist coating machine includes a pump, a switch valve, a sucking-back valve, a solenoid valve, a first set of speed controllers a second set of speed controllers and a sucking-back speed controller. The pump is used to transport liquid photoresist to a wafer through the switch valve. The sucking-back valve is controlled by solenoid valve through the sucking-back speed controller to produce or release a sucking force on the liquid photoresist to prevent it from undesired dropping onto the wafer. The solenoid valve also controls the switch valve and the pump to start or stop photoresist dispensing. The first set of speed controllers is coupled between the switch valve and the solenoid valve and the second set of speed controller is coupled between the pump and the solenoid valve. The sucking-back speed controller is coupled between the sucking-back valve and the route, which is between the first set of speed controller and the switch valve so that the sucking-back valve has a sufficient delay time to effectively suck the liquid photoresist in a proper time order of operation.

Growing community of inventors

Kaohsiung, Taiwan

Hsien-Jung Hsu